Zobrazeno 1 - 1
of 1
pro vyhledávání: '"R. Pastuszek"'
Autor:
A. Obstarczyk, D. Kaczmarek, D. Wojcieszak, M. Mazur, J. Domaradzki, T. Kotwica, R. Pastuszek, D. Schmeisser, P. Mazur, M. Kot
Publikováno v:
Materials & Design, Vol 175, Iss , Pp - (2019)
In this work multi-magnetron sputtering stand was used for the deposition of the mixed oxides thin films based on HfO2 and TiO2. In order to obtain various material composition the power released to each magnetron (containing metallic hafnium and tit
Externí odkaz:
https://doaj.org/article/4c2b780cc15c458eba147739f6433482
