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pro vyhledávání: '"R. O. Shulipa"'
Autor:
H. Ye. Polozhii, A. G. Ponomarev, S. V. Kolinko, V. A. Rebrov, R. O. Shulipa, O. M. Kalinkevich, O. V. Kalinkevich
Publikováno v:
Âderna Fìzika ta Energetika, Vol 24, Pp 72-80 (2023)
Proton beam writing is a promising lithography method that is being developed in many countries. This method has significant advantages over other lithography methods, amongst all, there is the absence of the need for prefabricated pattern masks and
Externí odkaz:
https://doaj.org/article/3608b5a56c2f40e9a6c7e9bf784768dc