Zobrazeno 1 - 3
of 3
pro vyhledávání: '"R. Nasongkhla"'
Publikováno v:
10th Annual IEEE/SEMI. Advanced Semiconductor Manufacturing Conference and Workshop. ASMC 99 Proceedings (Cat. No.99CH36295).
Critical dimension (CD) control in lithography and etch processing is imperative in order to achieve optimum device yield and speed performance for semiconductor manufacturing. As linewidths are reduced, the sources of CD errors do not automatically
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3a74b44b2674f944e902fe2f1d89e504
https://doi.org/10.1109/asmc.1999.798202
https://doi.org/10.1109/asmc.1999.798202
Publikováno v:
IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168).
We describe the multivariate statistical process control approach which uses a weighted average metric as a metric plotted on a control chart. We show that the optimal weighted coefficient is a function of the mean-shift vector and covariance matrix
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::833a745f1cb092476534f93f3fc96641
https://doi.org/10.1109/asmc.1998.731373
https://doi.org/10.1109/asmc.1998.731373
Conference
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