Zobrazeno 1 - 10 of 28 pro vyhledávání: '"R. Lamendola"'
3
Plasma Assisted Dry Etching of Cobalt Silicide for Microelectronics Applications
Autor: Riccardo d'Agostino, P. Vasquez, A. Filippo, C. Rapisarda, Francesco Fracassi, R. Lamendola
Publikováno v: Journal of The Electrochemical Society. 143:701-707
The dry etching of cobalt silicide has been investigated to evaluate the most important process variables. It has been demonstrated that among the commonly used etchants, only chlorine atoms are suitable to react appreciably with CoSi 2 . Strong ion
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::472312e9edf0442e5b6befe47edb3621
https://doi.org/10.1149/1.1836504
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4
The chemistry of etching and deposition processes
Autor: Francesco Fracassi, R. Lamendola, Riccardo d'Agostino
Publikováno v: Pure and Applied Chemistry. 66:1185-1193
XPS surface analysis, particularly with an in situ approach, coupled with plasma diagnostic techniques, gives a fairly good insight of plasma-surface interactions. Specific examples to be discussed include etching of Al, Ti, TIN, W, and deposition of
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::4658b7e97fd14c5e3706a546159baea1
https://doi.org/10.1351/pac199466061185
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5
XPS, ICP and DPASV analysis of medieval pottery ? Statistical multivariate treatment of data
Autor: M. L. Curri, Angela Traini, Paolo Bruno, P. Favia, Maurizio Caselli, Annarosa Mangone, R. Lamendola, Caterina Laganara
Publikováno v: Fresenius' Journal of Analytical Chemistry. 350:168-177
Medieval ceramic sherds have been studied by inductively coupled plasma (ICP) emission spectroscopy and X-ray photoelectron spectroscopy (XPS) in order to acquire knowledge about technological achievements in pottery production in Apulia during the M
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::7f95e681b0c4f327f705ca32213908c4
https://doi.org/10.1007/bf00323182
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6
ChemInform Abstract: The Chemistry of Etching and Deposition Processes
Autor: Francesco Fracassi, Riccardo d'Agostino, R. Lamendola
Publikováno v: ChemInform. 25
XPS surface analysis, particularly with an in situ approach, coupled with plasma diagnostic techniques, gives a fairly good insight of plasma-surface interactions. Specific examples to be discussed include etching of Al, Ti, TIN, W, and deposition of
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::4b71cfab1991bf91a38277c958916d98
https://doi.org/10.1002/chin.199452311
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7
Akademický článek
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8
Synthesis of silicon carbide thin films by ion beam sputtering
Autor: Marco Alvisi, Teresa Ligonzo, Leander Tapfer, Annalisa Convertino, R. Lamendola, Antonio Valentini, R. Cingolani
Publikováno v: Scopus-Elsevier
Synthesis of silicon carbide (SiC) films has been obtained by means of ion beam sputtering. The films have been grown by co-sputtering Si and C targets by means of two Ar-ion beams at substrate temperatures ranging between 30 and 700°C. Chemical, st
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::72cf86a712d77c5fb2106acb4cabd5c2
http://www.scopus.com/inward/record.url?eid=2-s2.0-0032307127&partnerID=MN8TOARS
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10
Conference
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