Zobrazeno 1 - 6
of 6
pro vyhledávání: '"R. L. Rhoades"'
Autor:
S. M. Gorbatkin, R. L. Rhoades
Publikováno v:
Journal of Applied Physics. 80:2605-2613
Optical emission spectroscopy is used to investigate trends with changes in processing parameters for Ar/Cu plasmas in an electron‐cyclotron‐resonance (ECR) plasma deposition system. The primary motivation for this work is to monitor trends in io
Publikováno v:
Thin Solid Films. 253:382-385
An electron cyclotron resonance (ECR) plasma has been used in conjunction with a solid metal sputter target for Cu deposition over 200-mm diameters. The goal is to develop a deposition process suitable for filling submicron, high aspect ratio feature
Publikováno v:
Applied Physics Letters. 65:2672-2674
Hard boron suboxide thin films were deposited in an electron cyclotron resonance (ECR) microwave plasma system at substrate temperatures below 300 °C. A high‐temperature effusion cell, operated at 2200°–2250 °C, was used for injection of boron
Autor:
S. M. Gorbatkin, R. L. Rhoades
Publikováno v:
Applied Physics Letters. 65:2004-2006
Optical emission from neutrals and ions of several noble gases has been profiled in an electron cyclotron resonance plasma system. In argon plasmas with a net microwave power of 750 W, the neutral (696.5‐nm) and ion (488‐nm) emission profiles are
Autor:
J. T. Verdeyen, R. L. Rhoades
Publikováno v:
Applied Physics Letters. 60:2951-2953
The first known instance of electron beam pumped lasing on the 546.1 nm transition in mercury (Hg) is reported. This has been achieved using high‐energy electrons to create excitation and ionization in a coaxial diode chamber containing a mixture o
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 14:1853
A permanent magnet electron cyclotron resonance microwave plasma source has been coupled to a copper sputter target to produce ionized copper fluxes for submicron integrated circuit metallization. A custom launcher assembly allows the use of microwav