Zobrazeno 1 - 10
of 36
pro vyhledávání: '"R. L. Pfeffer"'
Autor:
R. Ramesh, Sanjeev Aggarwal, S Sambasivan, B. Nielsen, A. R. Moodenbaugh, T. Friessnegg, R. L. Pfeffer, Daniel A. Fischer
Publikováno v:
Physical Review B. 61:5666-5671
Oxygen K near-edge x-ray-absorption fine-structure (NEXAFS) of polycrystalline and film ${\mathrm{La}}_{1\ensuremath{-}x}{\mathrm{Sr}}_{x}{\mathrm{CoO}}_{3\ensuremath{-}\ensuremath{\delta}}$ at room temperature was studied using fluorescence yield te
Autor:
Cole W. Litton, J. R. Flemish, R. L. Pfeffer, R. L. Jones, C. E. Stutz, R. E. Sherriff, T. P. Monahan, R. T. Lareau, Kenneth A. Jones, David C. Look
Publikováno v:
Journal of Crystal Growth. 167:406-414
δ-doped PHEMT structures commercially grown by OMVPE and MBE on 3 inch wafers were examined using contactless resistance, magneto-Hall, PR, PL, DXRD, RBS, SIMS, and electrochemical capacitance-voltage measurements, and 0.1 μm gate length devices we
Autor:
Stephen J. Pearton, C. Yuan, Melanie W. Cole, Richard A. Stall, Fan Ren, W. Y. Han, R. L. Pfeffer, Yicheng Lu, Y. Li, D. W. Eckart, T. Monahan
Publikováno v:
Journal of Applied Physics. 80:278-281
W was found to produce low specific contact resistance (ρc∼8.0×10−5 Ω cm2) ohmic contacts to n+‐GaN (n=1.5×1019 cm−3) with limited reaction between the metal and semiconductor up to 1000 °C. The formation of the β–W2N and W–N interf
Autor:
R. T. Lareau, Kenneth A. Jones, J. R. Flemish, R. L. Jones, C. E. Stutz, David C. Look, R. L. Pfeffer, T. Monahan, Cole W. Litton, R. E. Sherriff
Publikováno v:
Journal of Electronic Materials. 24:1641-1648
Symmetric δ-doped InGaP and AlGaAs PHEMT structures have been grown by organometallic vapor phase epitaxy with properties that approach those of MBE grown AlGaAs structures. The 300 and 77K carrier concentrations for the InGaP PHEMT were 2.72 and 2.
Publikováno v:
Journal of The Electrochemical Society. 142:1640-1643
Paraelectric lead lanthanum titanate (PLT) thin films have been prepared by a reactive dc magnetron sputtering system using a multicomponent metal target. The surface area control of each element on the target markedly facilitates the fabrication of
Publikováno v:
Physica Status Solidi (a). 140:283-293
Experimental studies of the formation and electrical characterization of TiSi2/n + /p-Si shallow junctions are presented. The formation of shallow n + p junction, by ion implantation of As + through Ti films evaporated on p-Si substrates followed by
Autor:
R. L. Pfeffer, J. R. Flemish
Publikováno v:
Journal of Applied Physics. 74:3277-3281
The material and electrical properties of SiNx:H films deposited using a 2% SiH4/N2 mixture with additional N2 in an electron cyclotron resonance reactor have been evaluated. Deposition rate, refractive index, and stoichiometry have been determined u
Publikováno v:
ChemInform. 24
This study investigates the use of diethylsilane as a single precursor to synthesize by low pressure chemical vapor deposition of amorphous SiC films. At 700 C, the deposition rate was observed to vary linearly with flow rate and pressure while the s
Publikováno v:
Applied Surface Science. :855-860
Layers of GaAs and Ca0.5Sr0.5F2 are grown by molecular beam epitaxy. The morphology, orientation, composition and crystallinity of the layers are analyzed as a function of growth temperature and surface treatment. The fluoride layers show a high degr
Publikováno v:
Applied Physics Letters. 66:830-832
Superlattice heterostructures consisting of alternating single crystalline ferrimagnetic yttrium–iron–garnet (YIG) and bismuth–iron–garnet (BIG) thin film layers on gadolinium–gallium–garnet substrates show an increased saturation magneti