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Publikováno v:
Soldering & Surface Mount Technology. 32:235-240
Purpose The purpose of this paper is to analyze the individual steps during the printing of capacitor structures. The method of substrate preparation, the obtained roughness of conductive and dielectric layers are examined. Moreover, the capacitances
Publikováno v:
Applied Surface Science. 484:1234-1243
The mixed thermal oxidation of the high temperature aluminium nitride (HT-AlN) epitaxial layer leads to the formation of the stable aluminium oxide having a developed surface area, potentially suitable for sensor applications. In this work, we studie
Autor:
Patrycja Suchorska-Woźniak, Rafal Szukiewicz, Maciej Krawczyk, Helena Teterycz, R. Korbutowicz, Maciej Kuchowicz
Publikováno v:
Nanomaterials, Vol 11, Iss 456, p 456 (2021)
Nanomaterials
Volume 11
Issue 2
Nanomaterials
Volume 11
Issue 2
Gas sensitive structures made of nanowires exhibit extremally large specific surface area, and a great number of chemically active centres that can react with the ambient atmosphere. This makes the use of nanomaterials promising for super sensitive g
Publikováno v:
Materials Science-Poland, Vol 35, Iss 2, Pp 412-420 (2017)
An attempt has been undertaken to produce gallium oxide nanowires by thermal synthesis from metallic gallium source at atmospheric pressure. Silicon substrates of (1 0 0) and (1 1 1) orientation with and without silicon oxide layers (0.5 μm) were us
Publikováno v:
Journal of Materials Science: Materials in Electronics. 28:13937-13949
This paper presents an analysis of thermal oxidation kinetics for Aluminium nitride (AlN) epitaxy layers using three methods: dry, wet and mixed. The structures thus obtained were examined by means of scanning electron microscope, energy-dispersive X
Autor:
Jarosław Serafińczuk, Joanna Prazmowska, Regina Paszkiewicz, Andrzej Stafiniak, R. Korbutowicz
Publikováno v:
Advances in Electrical and Electronic Engineering, Vol 17, Iss 2, Pp 229-233 (2019)
In this work, the thermal synthesis and characterization of gallium oxide and indium oxide nanowires using vapour-liquid-solid mechanism at atmospheric pressure were described. Au nanoislands formed by the solid-state dewetting process of various thi
Autor:
R. Korbutowicz, Adrian Zakrzewski
Publikováno v:
Materials Science-Poland, Vol 34, Iss 1, Pp 157-163 (2016)
Three methods of AlN layers oxidation: dry, wet and mixed (wet with oxygen) were compared. Some physical parameters of oxidized thin films of aluminum nitride (AlN) layers grown on silicon Si(1 1 1) were investigated by means Energy-Dispersive X-ray
Publikováno v:
Crystal Research and Technology. 43:1339-1344
Raman scattering spectroscopy was utilized for investigation of the structural properties of thick GaN layers. These layers with thickness ∼ 40 μm have been grown by HVPE technique on the sapphire substrates. The investigations have been focused o
Autor:
Jan Misiewicz, Jarosław Serafińczuk, Artur Podhorodecki, Marek Tłaczała, R. Korbutowicz, Regina Paszkiewicz, Joanna Prazmowska, Adam Szyszka
Publikováno v:
Vacuum. 82:988-993
The influence of deposition conditions of nucleation GaN layer on the properties of high-temperature GaN layer, grown on sapphire substrates, was investigated. The hydride vapor phase epitaxy (HVPE) three-section horizontal hot-wall furnace technique