Zobrazeno 1 - 2
of 2
pro vyhledávání: '"R. Kh. Makhmutov"'
Publikováno v:
Vacuum. 42:133-137
Experimental results on a stencil mask picture (size 0.1 ωm) are presented which transfer by electron beam into a positive resistance layer (thickness 0.3–1.5 μm). The dependence of pattern profile vs electron energy and radiation dose is investi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7774cc67381ddf48de34c9ee9e1d5b29
https://doi.org/10.1016/0042-207x(91)90095-z
https://doi.org/10.1016/0042-207x(91)90095-z
Publikováno v:
Microelectronic Engineering. 11:389-395
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::526e5ecf9192cc8343c269c04a567cfc
https://doi.org/10.1016/0167-9317(90)90137-i
https://doi.org/10.1016/0167-9317(90)90137-i