Zobrazeno 1 - 10
of 23
pro vyhledávání: '"R. K. F. J. Bastiaensen"'
Autor:
C. Bruineman, Frederik Bijkerk, R. K. F. J. Bastiaensen, A. van Honk, L. A. Shmaenok, Alexander P. Shevelko
Publikováno v:
Microelectronic Engineering. 27:299-301
Experimental results are reported on the development of a low-contamination laser-plasma source for extreme ultra-violet lithography (EUVL). The results concern the intensity in the 12.5 to 15.5 nm wavelength range and the pollution of EUV optics by
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b531c31e892a19bf5a2ba14d10383542
https://doi.org/10.1016/0167-9317(94)00111-7
https://doi.org/10.1016/0167-9317(94)00111-7
Autor:
S S Churilov, L. A. Shmaenok, R. K. F. J. Bastiaensen, Frederik Bijkerk, Alexander P. Shevelko
Publikováno v:
Physica Scripta, 57, 276-282
Spectra from various target materials from a KrF-laser plasma source have been investigated in the Extreme UV spectral range between 12 and 17 nm using an off-Rowland grazing-incidence spectrograph. The electron temperature T-e and mean ionization st
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b117e661c745bd0e35aab0abd3914794
https://doi.org/10.1088/0031-8949/57/2/023
https://doi.org/10.1088/0031-8949/57/2/023
Autor:
N.B. Koster, Yu.Ya. Platonov, H.-J. Voorma, C. Bruineman, Johannes A. Romijn, R. K. F. J. Bastiaensen, T. Zijlstra, L. E. M. de Groot, Eric Louis, N. N. Salashchenko, B. A. C. Rousseeuw, L. A. Shmaenok, Frederik Bijkerk, E. van der Drift
Publikováno v:
Microelectronic Engineering, 30, 183-186
Scopus-Elsevier
Scopus-Elsevier
Results are reported on the development of a laser plasma source and the fabrication of multilayer reflection masks for extreme ultra-violet lithography (EUVL). A new concept of a target for a laser plasma source is presented including experimental e
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1d0684458fb2dfc83f2aecda333c46f7
https://doi.org/10.1016/0167-9317(95)00222-7
https://doi.org/10.1016/0167-9317(95)00222-7
Autor:
L. A. Shmaenok, C. Bruineman, R. K. F. J. Bastiaensen, A. N. Gladskikh, Fred Bijkerk, Dmitrii M. Simanovski, Sergei V. Bobashev, Alexander P. Shevelko
Publikováno v:
Applications of Laser Plasma Radiation II.
Results on laser plasma EUV characteristics for various target materials and irradiation conditions are presented. Spectra of high-Z elements in the 12.5-15.4 nm range from plasmas generated with a high-power KrF laser at 2 X 1012 W/cm2 were measured
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::aa07cb36568507231b315c9ee4a1d633
https://doi.org/10.1117/12.220971
https://doi.org/10.1117/12.220971
Autor:
A. V. Mitrofanov, R. K. F. J. Bastiaensen, Bernard K. Nikolaus, F. Voß, Frederik Bijkerk, A. van Honk, Alexander P. Shevelko, H. Frowein, R. Desor, Yu.Ya. Platonov, L. A. Shmaenok
Publikováno v:
Journal De Physique Iii, 4, 1669-1677
Results are reported concerning high-repetition-rate excimer lasers with average powers up to 415 W and their usage for generating laser-plasma soft X-ray sources. A conversion efficiency of laser light into monochromatized soft X-ray radiation of 0.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::833d4da950385d2719baf37467e3c8d8
https://www.differ.nl/bibcite/reference/5631
https://www.differ.nl/bibcite/reference/5631
Autor:
Yeates, P., Kennedy, E. T.
Publikováno v:
Journal of Applied Physics; Nov2010, Vol. 108 Issue 9, p093306, 12p, 1 Color Photograph, 1 Diagram, 12 Graphs
Publikováno v:
Applied Physics B: Lasers & Optics. 1998, Vol. 67 Issue 3, p391. 3p.
Publikováno v:
Review of Scientific Instruments; May2016, Vol. 87 Issue 5, p053106-1-053106-4, 4p, 5 Diagrams, 1 Chart, 3 Graphs
Publikováno v:
Physics of Plasmas; Aug2015, Vol. 22 Issue 8, p1-9, 9p, 2 Charts, 4 Graphs
Publikováno v:
EUV Sources for Lithography; 1/ 1/2006, Vol. PM149, p721-734, 14p