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pro vyhledávání: '"R. J. Amodeo"'
Autor:
Nasr M. Ghoniem, R. J. Amodeo
Publikováno v:
Physical Review B. 41:6958-6967
A new methodology in computational micromechanics, dislocation dynamics (DD), is introduced. Dislocation dynamics is developed for examining the dynamic behavior of dislocation distributions in solid materials. Under conditions of externally applied
Autor:
R. J. Amodeo, Ben R. Vampatella, George A. Gomba, Alex L. Flamholz, Carl Stahlhammer, D. A. Heald, Azalia A. Krasnoperova, P. C. Kochersperger, Robert H. Fair, J. P. Silverman, William Chu, Alek C. Chen, Vincent Dimilia, Robert P. Rippstein
Publikováno v:
SPIE Proceedings.
A state-of-the-art proximity x-ray lithography aligner was developed for the Defense Advanced Lithography Program (DALP) and installed in IBM's Advanced Lithography Facility (ALF) in 1995. This aligner was designed to satisfy the manufacturing requir
Autor:
R. J. Amodeo, Nasr M. Ghoniem
Publikováno v:
Physical review. B, Condensed matter. 41(10)
The dynamic organization of dislocations into spatially heterogeneous substructures is demonstrated by applying the principles of dislocation dynamics that were outlined in the preceding paper. Here it is shown that the formation of persistent slip b
Autor:
R. J. Amodeo, N. M. Ghoniem
Publikováno v:
Patterns, Defects and Materials Instabilities ISBN: 9789401067553
A new method for the numerical simulation of dislocation patterns in solids undergoing plastic deformation is introduced. The term dislocation dynamics (DD) is used to describe the technique and to distinguish it from traditional molecular dynamics (
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9afe761b67e80fbb9878a4905946dedc
https://doi.org/10.1007/978-94-009-0593-1_21
https://doi.org/10.1007/978-94-009-0593-1_21
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 15:2476
The 180 nm ground rule production prototype x-ray lithography aligner was developed for the Defense Advanced Lithography Program (DALP) and installed in IBM’s Advanced Lithography Facility (ALF) in 1995. This aligner is designed to satisfy the manu