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Autor:
E. J. M. Van Heesch, T. Huiskamp, K. Yan, F. J. C. M. Beckers, H. W. M. Smulders, G. J. J. Winands, R. H. P. Lemmens, P. P. M. Blom, S. Davalos Segura, W. F. L. M. Hoeben, S. V. B. Van Paasen, J. J. Van Oorschot, A. G. A. Bonkestoter, M. L. J. Van Den Brand, M. Hennink, R. W. J. Smulders, A. J. M. Pemen, P. C. T. Van Der Laan
Publikováno v:
Frontiers in Chemistry, Vol 12 (2024)
A promising pollution control technology is cold plasma driven chemical processing. The plasma is a pulsed electric gas discharge inside a near atmospheric-pressure-temperature reactor. The system is energized by a continuous stream of very short hig
Externí odkaz:
https://doaj.org/article/40e3ccd3cc2c496bbc9abd60a7657904
