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The electrical properties of hydrogenated amorphous silicon (a‐Si:H) metal–semiconductor–metal (MSM) devices are investigated as a function of Si bombardment dose prior to and after annealing. We observe that conduction in unbombarded devices i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3401388b6bc9c33f9d149aa33cf6cc60
https://surrey.eprints-hosting.org/394/
https://surrey.eprints-hosting.org/394/
Publikováno v:
MRS Proceedings. 742
Metal-semiconductor-metal (MSM) memory devices have been made in hydrogenated amorphous silicon carbide (a-SiCx:H). Switching in silicon-rich amorphous silicon alloys is believed to be related to the concentration of defects in the semiconductor mate
Publikováno v:
Journal of Applied Physics. 97:024506
Polarity-dependent forming in ion bombarded metal-semiconductor-metal (MSM) memory devices of hydrogenated amorphous silicon is reported. It is shown that prior to ion bombardment, current transport in the MSM devices is asymmetric and is controlled