Zobrazeno 1 - 2
of 2
pro vyhledávání: '"R. Fred Grabner"'
Autor:
John S. Taylor, Mark A. Schmidt, Claude Montcalm, Regina Soufli, James A. Folta, R. Fred Grabner, Christopher C. Walton, Courtney Davidson, Eric M. Gullikson, Sherry L. Baker, Stanley Mrowka, Eberhard Spiller, Russell M. Hudyma, Henry N. Chapman, Benjamin B Kaufmann
Publikováno v:
SPIE Proceedings.
One of the most critical tasks in the development of extreme ultraviolet lithography (EUVL) is the accurate deposition of reflective multilayer coatings for the mirrors comprising the EUVL tool. The second set (Set 2) of four imaging optics for an al
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::537092defb0a0d7102786fe9672f7415
https://doi.org/10.1117/12.436695
https://doi.org/10.1117/12.436695
Autor:
Eberhard Spiller, Marco Wedowski, Troy W. Barbee, Tai D. Nguyen, James A. Folta, Claude Montcalm, R. Fred Grabner, Saša Bajt, Paul B. Mirkarimi, Mark A. Schmidt, Christopher C. Walton
Publikováno v:
SPIE Proceedings.
Multilayer mirror coatings which reflect extreme UV (EUV) radiation are a key enabling technology for EUV lithography but must meet stringent requirements in terms of film quality, stability, and thickness control across multi optical elements up to
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::31339e7f3c6bca99ea93dba8424aed0d
https://doi.org/10.1117/12.351156
https://doi.org/10.1117/12.351156