Zobrazeno 1 - 8
of 8
pro vyhledávání: '"R. Fabian W. Pease"'
Publikováno v:
Review of Scientific Instruments. 75:1997-2002
Localized, controlled heating can induce a thermal stress field in silicon wafers and displace the surface topography in three dimensions, which is useful for nanoscale regulation of overlay in microcontact printing systems. Simulation and experiment
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0353ed71768c61c23f76dddc87fe8568
https://doi.org/10.1063/1.1753101
https://doi.org/10.1063/1.1753101
Autor:
R. Fabian W. Pease
Publikováno v:
Physics Today. 64:8-8
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::254cdf97ee27d7bd00fd64bd890ed537
https://doi.org/10.1063/1.3563831
https://doi.org/10.1063/1.3563831
Publikováno v:
ACS Symposium Series ISBN: 9780841226623
Irradiation of Polymeric Materials: Processes, Mechanisms, and Applications
Irradiation of Polymeric Materials: Processes, Mechanisms, and Applications
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fdc9ec3e243c0ba19cf5788ff2e670a0
https://doi.org/10.1021/bk-1993-0527.ch016
https://doi.org/10.1021/bk-1993-0527.ch016
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 8:1441
We have used Langmuir–Blodgett (LB) techniques to prepare very thin (≤1000 A), uniform organic films, and we have investigated their potential use in lithographic applications. Resist films were prepared using novolac and poly (p‐hydroxystyrene
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d86af8117e31a91576b05d31572acd3d
https://doi.org/10.1116/1.585094
https://doi.org/10.1116/1.585094
Autor:
Kenny K. Toh, Chong-Cheng Fu, Kevin L. Zollinger, Andrew R. Neureuther, R. Fabian W. Pease, Burn J. Lin
Publikováno v:
SPIE Proceedings.
Two-dimensional image simulation with SPLAT and resist profile dissolution simulation with SAMPLE are used to explore the suppression of large defects with voting in projection printing. The parameters chosen are for the Ultratech 1000 stepper due to
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9a58a5b0c222f4d97cd90842268ecedc
https://doi.org/10.1117/12.968413
https://doi.org/10.1117/12.968413
Akademický článek
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Publikováno v:
Japanese Journal of Applied Physics; December 1992, Vol. 31 Issue: 12 p4474-4474, 1p
Autor:
ELSA REICHMANIS, CURTIS W. FRANK, JAMES H. O'DONNELL, David J. T. Hill, Philip W. Moore, Yoneho Tabata, T. T. Le, M. C. Senake Perera, Peter J. Pomery, B. J. Lyons, W. C. Johnson, David F. Sangster, P. A. Dworjanyn, J. L. Garnett, M. A. Long, Y. C. Nho, M. A. Khan, C. E. Hoyle, A. C. Griffin, D. Kang, C. P. Chawla, Josef Michl, Ya-Ping Sun, K. P. Ghiggino, C. G. Barraclough, R. J. Harris, Minoru Toriumi, Hiroshi Masuhara, A. E. Novembre, J. E. Hanson, J. M. Kometani, W. W. Tai, L. F. Thompson, Hiroshi Ito, J. W. Taylor, C. Babcock, M. Sullivan, Laura L. Kosbar, R. Fabian W. Pease, John Hutchinson, D. J. Ehrlich, R. R. Kunz, M. A. Hartney, M. W. Horn, J. Melngailis, Philip R. Young, Wayne S. Slemp, C. B. Saunders, A. Singh, V. J. Lopata, W. Kremers, M. Tateishi, Shalaby W. Shalaby, Dennis D. Jamiolkowski, Rao S. Bezwada