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pro vyhledávání: '"R. F. Schnabe"'
Autor:
R. F. Schnabe, Stefan J. Weber, P. W. DeHaven, Kenneth P. Rodbell, Roy C. Iggulden, Clevenger Leigh Anne H
Publikováno v:
MRS Proceedings. 514
Interconnection metallization uses film stacks, often composed of thin ( and and Al reflections for a series of 20 nm Ti/ 10 nm TiN/400 nm AlCu films using both a conventional Siemens D500 diffractometer with a pole figure attachment and a Siemens HI