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pro vyhledávání: '"R. Etemadi"'
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Akademický článek
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Publikováno v:
Journal of Applied Physics. 83:5691-5701
Large diameter (>10 mm) microwave discharges at atmospheric pressure are often constricted transversely and, when large gas flow rates are used, unstable as far as microwave power coupling is concerned. A group of small bore tubes can be used instead
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::91ef26022b458801cf61c27bad6ea35f
https://doi.org/10.1063/1.367423
https://doi.org/10.1063/1.367423
Publikováno v:
Journal of Applied Physics. 83:5224-5232
This study is focused on the deposition and growth of amorphous silicon oxide optical thin films in a dual-mode (microwave/rf) reactor. The optical, chemical, and structural properties of a-SiOx:H films have been studied as a function of different pa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6f6d21503878c4523df968e93e6ae3ce
https://doi.org/10.1063/1.367343
https://doi.org/10.1063/1.367343
Autor:
J. Y. Parey, R. Etemadi, J.C. Rostaing, J. Huc, F. Coeuret, Jérôme Perrin, Christian Godet, Bernard Drevillon
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 15:320-331
A dual-plasma [surface wave-coupled microwave (MW) at 2.45 GHz and capacitively coupled radio frequency (rf) at 13.56 MHz] reactor called MORFAX was developed for the deposition of amorphous wide band-gap alloys (a-SiOx:H, a-SiNy:H) at high growth ra
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7f3fc167644925af816efe2f9e3a9a35
https://doi.org/10.1116/1.580487
https://doi.org/10.1116/1.580487
Autor:
R. Etemadi, J.L. Fave, Bernard Drevillon, Christian Godet, T. Heitz, J. Cernogora, Jean-Eric Bourée
Publikováno v:
Journal of Non-Crystalline Solids. :623-627
Butane has been decomposed in the post-discharge of a helium-argon microwave plasma, assisted by a radiofrequency (rf) plasma. The ion bombardment on the substrate, monitored by the rf power, is found to control the optical and luminescence propertie
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d83083550f617282dceecba94a18bc54
https://doi.org/10.1016/0022-3093(95)00776-8
https://doi.org/10.1016/0022-3093(95)00776-8
Publikováno v:
Surface and Coatings Technology
Surface and Coatings Technology, Elsevier, 1996, 80, pp.8-12
Surface and Coatings Technology, Elsevier, 1996, 80, pp.8-12
Hydrogen incorporation in amorphous silicon oxide thin films a-SiO x :H (0.5 < x < 2.0) was studied quantitatively by combining nuclear analysis (Rutherford backscattering spectrometry (RBS) and elastic recoil detection analysis (ERDA)) and IR absorp
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::daf85144d220200afad153cac52ef2cf
https://doi.org/10.1016/0257-8972(95)02677-0
https://doi.org/10.1016/0257-8972(95)02677-0
Publikováno v:
Synthetic Metals. 76:191-194
A dual-mode microwave (MW)-radio frequency (RF) plasma reactor has been used for the deposition of hydrogenated amorphous carbon (a-C:H) thin films. Butane is injected and decomposed in the post-discharge of a helium-argon MW plasma, assisted by an R
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6501001faa8b2bf03f14c22ef0ac9ea8
https://doi.org/10.1016/0379-6779(95)03450-x
https://doi.org/10.1016/0379-6779(95)03450-x
Publikováno v:
Thin Solid Films. 270:49-54
Thin near-stoichiometric silica films were deposited by plasma-enhanced chemical vapour deposition (PECVD) using pure SiH4 and O2 in a planar plasma reactor based on the proprietary uniform distributed electron cyclotron resonance (UDECR) technology.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e55221a30d643790c947f077e506dbca
https://doi.org/10.1016/0040-6090(96)80068-x
https://doi.org/10.1016/0040-6090(96)80068-x