Zobrazeno 1 - 7
of 7
pro vyhledávání: '"R. E. Spirin"'
Publikováno v:
Instruments and Experimental Techniques. 56:178-184
A design and electric circuits of the power supply for magnetron sputtering systems with a power of up to 5 kW are described. The power supply is intended for operation in direct-current (DC) or pulse modes with a pulse repetition rate of up to 100 k
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5c5935e3903d384945de07158775b0f7
https://doi.org/10.1134/s0020441213010302
https://doi.org/10.1134/s0020441213010302
Autor:
Efim Oks, Ian G. Brown, Mauro Sergio Dorsa Cattani, W. W. R. Araujo, Fernanda de Sá Teixeira, Maria Cecília Barbosa da Silveira Salvadori, L. G. Sgubin, R. E. Spirin
Publikováno v:
Repositório Institucional da USP (Biblioteca Digital da Produção Intelectual)
Universidade de São Paulo (USP)
instacron:USP
Universidade de São Paulo (USP)
instacron:USP
We describe an approach to ion implantation in which the plasma and its electronics are held at ground potential and the ion beam is injected into a space held at high negative potential, allowing considerable savings both economically and technologi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4b16423fae90d6306a3e88146c66e320
Autor:
L. G. Sgubin, Efim Oks, R. E. Spirin, Ian G. Brown, Maria Cecília Barbosa da Silveira Salvadori, Fernanda de Sá Teixeira, W. W. R. Araujo
Publikováno v:
Repositório Institucional da USP (Biblioteca Digital da Produção Intelectual)
Universidade de São Paulo (USP)
instacron:USP
Universidade de São Paulo (USP)
instacron:USP
Whereas energetic ion beams are conventionally produced by extracting ions (say, positive ions) from a plasma that is held at high (positive) potential, with ion energy determined by the potential drop through which the ions fall in the beam formatio
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::74759f0f836e69764665421fc684f0d8
https://pubmed.ncbi.nlm.nih.gov/23464210
https://pubmed.ncbi.nlm.nih.gov/23464210
Autor:
R. E. Spirin, Maria Cecília Barbosa da Silveira Salvadori, M. R. S. Oliveira, Mauro Sergio Dorsa Cattani, Ian G. Brown, Fernanda de Sá Teixeira
Publikováno v:
Repositório Institucional da USP (Biblioteca Digital da Produção Intelectual)
Universidade de São Paulo (USP)
instacron:USP
Universidade de São Paulo (USP)
instacron:USP
Superhydrophobic surfaces formed of microcavities can be designed with specific desired advancing and receding contact angles using a new model described by us in prior work. Here, we discuss the limits of validity of the model, and explore the appli
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8da796fb6a71ccd8106dac7fe6b9127f
Autor:
W. W. R. Araujo, Maria Cecília Barbosa da Silveira Salvadori, N. S. Sochugov, R. E. Spirin, Fernanda de Sá Teixeira, L. G. Sgubin, Ian G. Brown
Publikováno v:
The Review of scientific instruments. 81(12)
We describe the design and implementation of a high voltage pulse power supply (pulser) that supports the operation of a repetitively pulsed filtered vacuum arc plasma deposition facility in plasma immersion ion implantation and deposition (Mepiiid)
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ce3d780484caeba10c7652a861382e31
https://pubmed.ncbi.nlm.nih.gov/21198040
https://pubmed.ncbi.nlm.nih.gov/21198040
Autor:
Maria Cecília Barbosa da Silveira Salvadori, Fernanda de Sá Teixeira, Ian G. Brown, R. E. Spirin, L. G. Sgubin, Mauro Sergio Dorsa Cattani
Publikováno v:
Journal of Applied Physics. 116:184306
Composites of titanium nanoparticles in alumina were formed by ion implantation of titanium into alumina, and the surface electrical conductivity measured in situ as the implantation proceeded, thus generating curves of sheet conductivity as a functi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2d36e9e0144687fa3dc35e302e0da577
https://doi.org/10.1063/1.4901643
https://doi.org/10.1063/1.4901643
Autor:
R. E. Spirin, Ian G. Brown, W. W. R. Araujo, Kin Man Yu, Fernanda de Sá Teixeira, Maria Cecília Barbosa da Silveira Salvadori, Efim Oks, L. G. Sgubin
Publikováno v:
Applied Physics Letters. 101:224104
We describe an approach to ion implantation in which the plasma and its electronics are held at ground potential and the ion beam is formed and injected energetically into a space held at high negative potential. The technique allows considerable sav
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::44ec507eb7ad34c8f32653c8031d5506
https://doi.org/10.1063/1.4768699
https://doi.org/10.1063/1.4768699