Zobrazeno 1 - 9
of 9
pro vyhledávání: '"R. D. McLeod"'
Publikováno v:
Biological Engineering Transactions. 5:109-121
Modeling of epidemic spread within human populations has been an active research area for a considerable time, yet relatively little work has been done in investigating the modeling dynamics of epizootic spread in livestock populations within intensi
Publikováno v:
SSRR
This work investigates the promise of Bluetooth wireless communication protocol as a victim detection sensor. The fact that cellphones are carried by people can lead rescue robots to track Bluetooth devices alongside other victim detection sensors (e
Publikováno v:
Studies in health technology and informatics. 64
The purpose of this project is to create an advanced interactive speech therapy site that can be used over the World Wide Web (WWW). This multimedia site, which we have named Fonetix, includes animation of articulation, audio, and video display and c
Publikováno v:
Journal of Physics D: Applied Physics. 16:1801-1811
Optical constants of amorphous hydrogenated Si1-xGex(H) films fabricated by radio frequency sputtering have been measured for 0
Autor:
R. D. McLeod, T. V. Herak, H. Watanabe, K. C. Kao, M. G. Collett, Y. Shibata, H. C. Card, Kazuhisa Katoh, M. Yasui
Publikováno v:
Canadian Journal of Physics. 63:846-851
The optical and electronic properties of a-SiNx:H alloy films fabricated by rf glow discharge have been measured for 0 ≤ x ≤ 0.6. The material is dispersive over the range of photon energies 0.5 ≤ hv ≤ 3.5 eV. The optical gap is about 1.65 eV
Publikováno v:
Review of Scientific Instruments. 57:493-496
A new microwave plasma method for the fabrication of solid films is presented. Microwave power is efficiently transferred to the plasma, resulting in minimal power requirements. Uniform silicon films have been fabricated with a wide range of optical
Publikováno v:
Canadian Journal of Physics. 65:856-858
Electron cyclotron resonance microwave-plasma etching of Si and SiO2 using a (CF4 + O2) gas mixture is investigated in a magnetically confined plasma. High etch rates have been obtained at 0.8 Torr pressure, where the etching mechanism may be due pri
Autor:
R D, McLeod
Publikováno v:
Health bulletin. 29(1)
Publikováno v:
Applied Physics Letters. 48:163-164
An experimental study has been made of Si:H thin films prepared by microwave plasma deposition, in which conditions of electron cyclotron resonance can be obtained in the plasma due to an externally applied axial dc magnetic field B. It is observed t