Zobrazeno 1 - 10
of 43
pro vyhledávání: '"R. D. Heidenreich"'
Publikováno v:
Applied optics. 13(7)
The electron lithographic fabrication of high quality diffraction gratings with periods in the 0.25-microm < a(o) < 1.5-microm range is reported. The negative electron resist employed is a copolymer of glycidyl methacrylate and ethyl acrylate with a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6822e06f90116e8c28b1e9974384591d
https://pubmed.ncbi.nlm.nih.gov/20134533
https://pubmed.ncbi.nlm.nih.gov/20134533
Autor:
R. D. Heidenreich, G. W. Kammlott
Publikováno v:
Polymer Engineering and Science. 17:377-380
It is illustrated experimentally that swelling and deformation of narrow lines (width < 1 μm) is an important limitation on the fidelity and transverse resolution of negative electron resists. The thickness response curve developed for negative resi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2d73d4b3dc72fa9cbe40fbbdf1248749
https://doi.org/10.1002/pen.760170609
https://doi.org/10.1002/pen.760170609
Publikováno v:
Polymer Engineering and Science. 14:529-533
A class of negative electron-beam resists is described which have excellent lithographic characteristics. The resists are copolymers of glycidyl methacrylate and ethyl acrylate. Their molecular weights, epoxy contents, and polydispersivities can be c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::279b9b7a95065b0082bf87e0dce25e5b
https://doi.org/10.1002/pen.760140713
https://doi.org/10.1002/pen.760140713
Autor:
R. D. Heidenreich
Publikováno v:
Proceedings, annual meeting, Electron Microscopy Society of America. 35:2-5
This program has been organized by the EMSA to commensurate the 50th anniversary of the experimental verification of the wave nature of the electron. Davisson and Germer in the U.S. and Thomson and Reid in Britian accomplished this at about the same
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::002fe4b88b1b05d07b985bec0b673804
https://doi.org/10.1017/s0424820100077670
https://doi.org/10.1017/s0424820100077670
Publikováno v:
Journal of Vacuum Science and Technology. 12:1284-1288
Starting with a depth‐dose theory of electron energy dissipation in negative electron resists and a quasimonoenergetic Gaussian scattering theory, we derive theoretical expressions for single‐line profiles using the exposure parameters of the Bel
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e959619e567f6d7a32b1975cef1a5cbf
https://doi.org/10.1116/1.568518
https://doi.org/10.1116/1.568518
Autor:
R. D. Heidenreich
Publikováno v:
Journal of Applied Physics. 48:1418-1425
An electron backscatter model applicable to the exposure of resists in electron lithography is developed. The model is empirical, being based on the direct observation of chemical change produced by backscatter electrons at different accelerating vol
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::349e6e91140f79bf2a9ce909d5782ccc
https://doi.org/10.1063/1.323881
https://doi.org/10.1063/1.323881
Autor:
R. D. Heidenreich
Publikováno v:
Bell System Technical Journal. 30:867-887
Features of the dynamical or wave mechanical theory of electron diffraction pertinent to the interpretation of electron images of crystalline materials are briefly discussed. It is shown that the type of image obtained depends upon the local bending
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::44cdef7abdb30134448f7b6b5d5b3b5d
https://doi.org/10.1002/j.1538-7305.1951.tb03686.x
https://doi.org/10.1002/j.1538-7305.1951.tb03686.x
Publikováno v:
Journal of Applied Physics. 44:4048-4051
A study has been made of the use of low‐voltage exposure of negative resists for electron lithography. Three resists have been investigatd; an esterified terpolymer, epoxidized polybutadiene, and polyglycidyl methacrylate. The optimum exposure cond
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::794c866ace6c36497648771512de9781
https://doi.org/10.1063/1.1662893
https://doi.org/10.1063/1.1662893
Autor:
R. D. Burbank, R. D. Heidenreich
Publikováno v:
Philosophical Magazine. 5:373-382
Thin films of permalloy (81% Ni, 19% Fe) grown by evaporation on rock salt cleavage faces have been studied in the electron microscope. Selected area diffraction patterns indicate the presence of microtwinning on all types of {111} planes. The diffra
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ead2dba45dd8fdd8cf35617043143ca5
https://doi.org/10.1080/14786436008235855
https://doi.org/10.1080/14786436008235855
Publikováno v:
Journal of Applied Physics. 27:85-89
Magnetic torque measurements and electron diffraction patterns on several cobalt ferrite and cobalt‐zinc ferrite crystals show that those compositions which respond to heat treatment in a magnetic field contain precipitated particles of a second ph
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e8a25aa1ed4ac50d866cec299d7f5b57
https://doi.org/10.1063/1.1722202
https://doi.org/10.1063/1.1722202