Zobrazeno 1 - 10
of 17
pro vyhledávání: '"R. A. Rubtsova"'
Publikováno v:
Russian Mathematics. 66:112-117
Publikováno v:
Russian Mathematics. 66:70-73
Autor:
V. N. Shabanov, V. P. Kuznetsov, D. I. Kryzhov, G. A. Maksimov, D. Yu. Remizov, A. N. Shushunov, O. V. Belova, M. V. Stepikhova, Z. F. Krasilnik, R. A. Rubtsova
Publikováno v:
Semiconductors. 40:846-853
In Si:Er/Si diode structures grown by sublimation molecular-beam epitaxy in a vacuum with a pressure of ∼10−7 mbar at temperatures 520–580°C, the intensity of room-temperature electroluminescence at 1.54 μm is studied as a function of the con
Autor:
V. P. Kuznetsov, R. A. Rubtsova
Publikováno v:
Semiconductors. 34:502-509
The concentration of charge carriers and their Hall mobility in Si:Er/Si layers grown by sublimational molecular-beam epitaxy were investigated as functions of temperature in the range of 300–77 K. No electric activity of Er-containing luminescent
Publikováno v:
Physics of the Solid State. 42:548-553
The optical and electrophysical properties of the GaAs/In0.25Ga0.75As heterostructure with a symmetric double quantum well have been investigated. The influence of tunneling electrons and holes through an internal barrier of the quantum well on the s
Autor:
M. V. Stepikhova, V. B. Shmagin, S Lanzerstorfer, Z. F. Krasilnik, E. A. Uskova, A. Yu. Andreev, R. A. Rubtsova, Leopold Palmetshofer, Nikolai S. Sokolov, K. Piplits, Boris A. Andreev, Herbert Hutter, H. Ellmer, V. P. Kuznetsov
Publikováno v:
Journal of Crystal Growth. :534-537
We report the first application of sublimation molecular beam epitaxy to grow uniformly and selectively doped Si : Er layers with a high concentration of Er and O (up to ∼ 10 19 cm -3 ) and high quality of crystalline structure. All samples exhibit
Autor:
Z. F. Krasilnik, Boris A. Andreev, A. Yu. Andreev, M. V. Stepikhova, K. Piplits, V. B. Shmagin, R. A. Rubtsova, Leopold Palmetshofer, E. A. Uskova, Yu. A. Karpov, M. N. Drozdov, V. P. Kuznetsov, Herbert Hutter, H. Ellmer
Publikováno v:
Scopus-Elsevier
A study is made of the electrical, optical, and structural properties of Si:Er layers produced by sublimation molecular-beam epitaxy. The Er and O contents in the layers, grown at 400–600°C, were as high as 5×1018 and 4×1019 cm−3, respectively
Autor:
V. B. Shmagin, A. V. Andreev, Herbert Hutter, R. A. Rubtsova, Leopold Palmetshofer, M. V. Stepikhova, H. Ellmer, H. Preier, K. Piplits, Z. F. Krasilnik, W. Jantsch, V. P. Kuznetsov, Yu. A. Karpov, Boris A. Andreev
Publikováno v:
Acta Physica Polonica A. 94:549-554
Autor:
V.I. Vdovin, A. L. Chernov, N. A. Gorodilov, L. K. Orlov, O.A. Kuznetsov, R. A. Rubtsova, V. I. Gavrilenko, N. G. Kalugin
Publikováno v:
Solid State Phenomena. :469-474
Autor:
A. L. Chernov, O.A. Mironov, M. Oszwałdowski, O. A. Kuznetsov, B.A. Aronzon, L. K. Orlov, R. A. Rubtsova, N.K. Chumakov, S. V. Chistyakov
Publikováno v:
Superlattices and Microstructures. 10:467-470
For the first time, research on the unique galvanomagnetic properties of the hole gas in the channels of selectively doped CVD Ge-Ge 1−X Si X (X≤0, 2) superlattices with strained Ge layers was carried out. We have obtained a high value of the hol