Zobrazeno 1 - 10
of 286
pro vyhledávání: '"R. A. Kline"'
Autor:
S. L. Eaton, C. Proudfoot, S. G. Lillico, P. Skehel, R. A. Kline, K. Hamer, N. M. Rzechorzek, E. Clutton, R. Gregson, T. King, C. A. O’Neill, J. D. Cooper, G. Thompson, C. B. Whitelaw, T. M. Wishart
Publikováno v:
Scientific Reports, Vol 9, Iss 1, Pp 1-8 (2019)
Abstract The neuronal ceroid lipofuscinoses (NCLs) are a group of devastating monogenetic lysosomal disorders that affect children and young adults with no cure or effective treatment currently available. One of the more severe infantile forms of the
Externí odkaz:
https://doaj.org/article/7155c59c589e4aa29b872c1109c35b0c
Autor:
Weigang Zhu, Guoping Li, Subhrangsu Mukherjee, Natalia E. Powers-Riggs, Leighton O. Jones, Eliot Gann, R. Joseph Kline, Andrew Herzing, Jenna L. Logsdon, Lucas Flagg, Charlotte L. Stern, Ryan M. Young, Kevin L. Kohlstedt, George C. Schatz, Dean M. DeLongchamp, Michael R. Wasielewski, Ferdinand S. Melkonyan, Antonio Facchetti, Tobin J. Marks
Publikováno v:
Energy & Environmental Science. 16:1234-1250
TThe photovoltaic properties of binary and ternary blends of a polymer with molecular non-fullerene and fullerene acceptors are systematically investigated to provide morphology-charge dynamics–device performance design rules for future PSC develop
Autor:
Wen-li Wu, R. Joseph Kline, Ronald L. Jones, Hae-Jeong Lee, Eric K. Lin, Daniel F. Sunday, Chengqing Wang, Tengjiao Hu, Christopher L. Soles
Publikováno v:
Journal of Micro/Nanopatterning, Materials, and Metrology. 22
Publikováno v:
ACS Nano. 15:9577-9587
Interactions between polymers and surfaces can be used to influence properties including mechanical performance in nanocomposites, the glass transition temperature, and the orientation of thin film block copolymers (BCPs). In this work we investigate
Autor:
Ginusha M. Perera, Chengqing Wang, Gila E. Stein, R. Joseph Kline, Manolis Doxastakis, August W. Bosse, Wen-Li Wu
Publikováno v:
ACS macro letters. 1(11)
The depth-dependent structure of a poly(styrene-b-methylmethacrylate) (PS-PMMA) line grating (46 nm pitch) was calculated from quantitative analysis of small-angle X-ray scattering profiles. These ...
Autor:
R. R. Kline
Publikováno v:
Secuencias, Vol 0, Iss 5 (2016)
Externí odkaz:
https://doaj.org/article/666184e369b2466285c9016753546573
Autor:
Jacob L. Thelen, Eliot Gann, Dean M. DeLongchamp, Camille Bishop, R. Joseph Kline, Mark Ediger, Kushal Bagchi, Daniel F. Sunday, Subhrangsu Mukherjee, Lee J. Richter
Publikováno v:
Chemistry of Materials. 32:6295-6309
Molecular orientation anisotropy can be critical in functional organic thin films. For instance, it is known that molecular orientation can affect the performance of organic electronic devices such...
Autor:
Matthew C. Carlson, Daniel F. Sunday, Charles T. Rettner, Philip Liu, Ji Yeon Kim, Joy Cheng, R. Joseph Kline, C. Grant Willson, Christopher J. Ellison, Michael J. Maher, Nathaniel A. Lynd, Carlos R. Baiz, Gregory Blachut, Christopher M. Bates, Yusuke Asano, Devon H. Callan, Daniel P. Sanders
Publikováno v:
ACS Applied Materials & Interfaces. 12:23399-23409
Polarity-switching photopatternable guidelines can be directly used to both orient and direct the self-assembly of block copolymers. We report the orientation and alignment of poly(styrene-block-4-...
Autor:
Derek Nowak, Paulina Rincon Delgadillo, Albrecht Thomas R, Akiyoshi Yamazaki, Xuanxuan Chen, Takaya Maehashi, Paul F. Nealey, Ken Miyagi, R. Joseph Kline, Takahiro Dazai, Daniel F. Sunday
Publikováno v:
Chemistry of Materials. 32:2399-2407
The challenges of patterning next-generation integrated circuits have driven the semiconductor industry to look outside of traditional lithographic methods in order to continue cost-effective size ...
Autor:
F. Delachat, Christopher Liman, Raluca Tiron, Ahmed Gharbi, Daniel F. Sunday, Guillaume Freychet, R. Joseph Kline
Publikováno v:
Journal of Applied Crystallography. 52:106-114
The directed self-assembly (DSA) of block copolymers (BCPs) is a promising low-cost approach to patterning structures with critical dimensions (CDs) which are smaller than can be achieved by traditional photolithography. The CD of contact holes can b