Zobrazeno 1 - 10
of 10
pro vyhledávání: '"R M Sankaran"'
Autor:
J. R. Toth III, S. Rajupet, H. Squire, B. Volbers, J. Zhou, L. Xie, R. M. Sankaran, D. J. Lacks
Publikováno v:
Atmospheric Chemistry and Physics, Vol 20, Pp 3181-3190 (2020)
Large amounts of dust are lofted into the atmosphere from arid regions of the world before being transported up to thousands of kilometers. This atmospheric dust interacts with solar radiation and causes changes in the climate, with larger-sized part
Externí odkaz:
https://doaj.org/article/69f3a633268d482ea9f888f4a69ef289
Autor:
I Adamovich, S Agarwal, E Ahedo, L L Alves, S Baalrud, N Babaeva, A Bogaerts, A Bourdon, P J Bruggeman, C Canal, E H Choi, S Coulombe, Z Donkó, D B Graves, S Hamaguchi, D Hegemann, M Hori, H-H Kim, G M W Kroesen, M J Kushner, A Laricchiuta, X Li, T E Magin, S Mededovic Thagard, V Miller, A B Murphy, G S Oehrlein, N Puac, R M Sankaran, S Samukawa, M Shiratani, M Šimek, N Tarasenko, K Terashima, E Thomas Jr, J Trieschmann, S Tsikata, M M Turner, I J van der Walt, M C M van de Sanden, T von Woedtke
Publikováno v:
Journal of Physics D: Applied Physics, 55(37):373001. Institute of Physics
Journal of Physics D: Applied Physics, 55, 373001
Journal of physics: D: applied physics
e-Archivo. Repositorio Institucional de la Universidad Carlos III de Madrid
instname
Journal of Physics D: Applied Physics
Journal of Physics D: Applied Physics, 55, 373001
Journal of physics: D: applied physics
e-Archivo. Repositorio Institucional de la Universidad Carlos III de Madrid
instname
Journal of Physics D: Applied Physics
Documento escrito por un elevado número de autores/as, solo se referencia el/la que aparece en primer lugar y los/as autores/as pertenecientes a la UC3M. The 2022 Roadmap is the next update in the series of Plasma Roadmaps published by Journal of Ph
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1dfd5070a5f1f5999500e993944ce9a7
https://hdl.handle.net/2117/376648
https://hdl.handle.net/2117/376648
Autor:
Nicholas A. Anderson, Souvik Bhattacharya, Kaan K. Kirmanoglu, Kelly A. Stephani, Gregory Elliott, R. M. Sankaran, Francesco Panerai
Publikováno v:
AIAA SCITECH 2022 Forum.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8d605c36a716c5706ca74dda4320a0e2
https://doi.org/10.2514/6.2022-0114
https://doi.org/10.2514/6.2022-0114
Publikováno v:
Journal of The Electrochemical Society. 164:D818-D824
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d07574158bedfab82a9fe8e7d78b86da
https://doi.org/10.1149/2.0541713jes
https://doi.org/10.1149/2.0541713jes
Publikováno v:
Journal of The Electrochemical Society. 167:116504
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::be55f9536487c1ea42d273cf850cc6ac
https://doi.org/10.1149/1945-7111/aba15c
https://doi.org/10.1149/1945-7111/aba15c
Autor:
Rui Yang, Dibyendu Debnath, E. Ostrowski, R. M. Sankaran, Christian A. Zorman, Souvik Ghosh, Philip X.-L. Feng
Publikováno v:
Plasma Chemistry and Plasma Processing. 36:295-307
We describe an atmospheric-pressure plasma process for the reduction of metal cation-containing polymer films to form electrically conductive patterns. Thin films of poly(acrylic) acid (PAA) containing silver ions (Ag+) were prepared by mixing the po
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::54b9b9f2205fa1f59d45883b07972c6c
https://doi.org/10.1007/s11090-015-9665-2
https://doi.org/10.1007/s11090-015-9665-2
Autor:
R. M. Sankaran, Konstantinos P. Giapis
Publikováno v:
Applied Physics Letters. 79:593-595
Microdischarges in flexible copper-polyimide structures with hole diameters of 200 µm have been used as stencil masks to pattern bare silicon in CF4/Ar chemistry. The discharges were operated at 20 Torr using the substrate as the cathode, achieving
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1d1ced73cd67d70e56c15043a36cc3b6
https://doi.org/10.1063/1.1388867
https://doi.org/10.1063/1.1388867
Autor:
Wei-Hung Chiang, R. M. Sankaran
Publikováno v:
ECS Meeting Abstracts. :2687-2687
not Available.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6132eb32dc0dc1e19b8e8ad2db64058b
https://doi.org/10.1149/ma2008-02/44/2687
https://doi.org/10.1149/ma2008-02/44/2687
Publikováno v:
ECS Meeting Abstracts. :298-298
not Available.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c61ad1915abf52cadc1912997f3fb02d
https://doi.org/10.1149/ma2008-02/2/298
https://doi.org/10.1149/ma2008-02/2/298
Publikováno v:
ECS Meeting Abstracts. :1032-1032
Pulse Voltammetry is a useful technique in dealing with electrode processes at solid electrodes. Due to fast pulse times, the sensitivity of reverse pulse voltammetry to reactive intermediates can approach that of a rotating ring disk electrode. In r
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0f1c65a752b5cbdd86538a0aaeebd15b
https://doi.org/10.1149/ma2008-02/11/1032
https://doi.org/10.1149/ma2008-02/11/1032