Zobrazeno 1 - 10
of 39
pro vyhledávání: '"R A Paynter"'
Autor:
R. W. Paynter, Daniel Peykov
Publikováno v:
Surface and Interface Analysis. 48:54-63
Autor:
R. W. Paynter, M. Rondeau
Publikováno v:
Surface and Interface Analysis. 42:117-122
Angle-resolved X-ray photoelectron spectroscopy (ARXPS) data taken on a polystyrene film exposed to a nitrogen plasma are interpreted by the fitting of regularized depth profiles. Three ways of measuring the goodness of fit are compared—the χ2 sta
Autor:
Robert L. Opila, Thierry Conard, John T. Grant, Julia E. Fulghum, Keisuke Kobayashi, H. Nohira, Robert M. Wallace, J. Wolstenholme, G. Conti, Alberto Herrera-Gomez, László Kövér, Francisco S. Aguirre-Tostado, Wolfgang S. M. Werner, S. Oswald, R. W. Paynter, C. R. Brundle, M. Jenko, Peter J. Cumpson, Charles S. Fadley
Publikováno v:
Surface and Interface Analysis. 41:840-857
Report on the 47th IUVSTA Workshop ‘Angle-Resolved XPS: the current status and future prospects for angle-resolved XPS of nano and subnano films’ A. Herrera-Gomez,a,b∗ J. T. Grant,c P. J. Cumpson,d† M. Jenko,e F. S. Aguirre-Tostado,b C. R. Br
Autor:
R. W. Paynter
Publikováno v:
Surface and Interface Analysis. 41:595-601
Polystyrene films were exposed to nitrogen plasmas for periods up to 8 min. Angle-resolved X-ray photoelectron spectroscopy measurements revealed the presence of oxygen and nitrogen in the surface due to the plasma treatment. The depth profiles of th
Publikováno v:
Surface and Interface Analysis. 39:445-451
Polystyrene films were exposed to nitrogen plasmas for periods up to 4 min. ARXPS measurements revealed the presence of oxygen and nitrogen in the surface because of the plasma treatment. The depth profiles of these adatoms were determined by fitting
Autor:
M. Ménard, R. W. Paynter
Publikováno v:
Surface and Interface Analysis. 37:466-471
Angle-resolved x-ray photoelectron spectroscopy (ARXPS) measurements were made, using Al Ka and Mg Ka radiation alternately, on a polystyrene sample that had been exposed to a helium plasma. It was observed that oxygen was introduced into the sample
Autor:
M.‐C. Tremblay, R. W. Paynter
Publikováno v:
Surface and Interface Analysis. 35:502-514
Angle-resolved x-ray photoelectron spectroscopy (ARXPS) measurements were made, in repeated sequences employing Al and Mg x-ray sources alternately, on a polystyrene sample that had been exposed to an oxygen plasma. It was observed that oxygen was lo
Autor:
D. Nolet, R. W. Paynter
Publikováno v:
Surface and Interface Analysis. 35:960-967
In this study a silicon wafer was analysed by angle-resolved x-ray photoelectron spectroscopy and the data compared with a calculation based upon a simple model of the sample surface. The parameters in the mathematical model were varied in groups of
Autor:
R. W. Paynter
Publikováno v:
Surface and Interface Analysis. 35:932-939
Error surfaces are calculated for the fitting of concentration–depth profiles to angle-resolved x-ray photoelectron spectroscopy (ARXPS) data. The shapes of the error surfaces indicate that model parameters related to composition (especially at the
Autor:
R. W. Paynter
Publikováno v:
Surface and Interface Analysis. 33:14-22
Polystyrene films spin-coated onto glass were exposed to an oxygen/argon plasma. The depth profile of the oxygen in the polystyrene surface was characterized by angle-resolved x-ray photoelectron spectroscopy (ARXPS) 2, 24 and 92 h following the plas