Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Quek Shyue Fong"'
Autor:
Yang Qing, Perez Valerio, Narayana Samy Aravind, Sky Yeo, Ushasree Katakamsetty, Quek Shyue Fong, Hui Colin, Schiwon Roberto, Ruhm Matthias
Publikováno v:
SPIE Proceedings.
CMP effects on manufacturability are becoming more prominent as we move towards advanced process nodes, 28nm and below. It is well known that dishing and erosion occur during CMP process, and they strongly depend on pattern density, line spacing and
Autor:
Rachel Ren, Quek Shyue Fong, Amit Siany, Sern Loong Ng, Shimon Levi, Chan Sun Sun, Yasri Yudhistira, Koh Hui Peng
Publikováno v:
SPIE Proceedings.
In this paper, we study the feasibility of using a new system to set up offline critical dimension scanning electron microscope (CDSEM) recipes for both litho and etch processes monitoring in a foundry environment before first silicon. We will automa
Autor:
Perez, Valerio, Quek, Shyue Fong, Yeo, Sky, Hui, Colin, Lin, Kuang Kuo, Ng, Walter, Cote, Michel, Kasthuri, Bala, Hurat, Philippe, Thompson, Matt A., Yuan, Chi-Min, Sharma, Puneet
Publikováno v:
Proceedings of SPIE; Nov2009 Part 2, Issue 1, p72751S-72751S-10, 10p
Autor:
März, Reinhard, Peter, Kai, Gröndahl, Sonja, Keiner, Klaus, Choi, Byoung Il, Quek, Shyue Fong, Yeo, Mei Chun, Chen, Nan Shu, Goh, Soo Muay
Publikováno v:
Proceedings of SPIE; Nov2007 Part 2, Issue 1, p65210M-65210M-9, 9p
Publikováno v:
Proceedings of SPIE; Nov2006, Issue 1, p615437-615437-10, 10p
Publikováno v:
Proceedings of SPIE; Nov2005, Issue 1, p397-404, 8p