Zobrazeno 1 - 10
of 799
pro vyhledávání: '"Quantum lithography"'
Publikováno v:
Phys. Rev. A 93, 033837 (2016)
Diffraction of light sets the fundamental limit for optical lithography. Many quantum lithography schemes have so far been proposed to overcome this limit either by making use of highly entangled photons, multi-photon processes or multiple Lambda tra
Externí odkaz:
http://arxiv.org/abs/1501.06707
Publikováno v:
New J. Phys. 13, 043028 (2011)
Quantum lithography promises, in principle, unlimited feature resolution, independent of wavelength. However, in the literature at least two different theoretical descriptions of quantum lithography exist. They differ in to which extent they predict
Externí odkaz:
http://arxiv.org/abs/1006.2250
Publikováno v:
J. Opt. Soc. Am. B 24, 270 (2007)
We present a theoretical analysis of the properties of an unseeded optical parametic amplifier (OPA) used as the source of entangled photons for applications in quantum lithography. We first study the dependence of the excitation rate of a two-photon
Externí odkaz:
http://arxiv.org/abs/quant-ph/0608170
Autor:
Tsang, Mankei
Publikováno v:
Physical Review A 75, 043813 (2007)
The proposal of quantum lithography [Boto et al., Phys. Rev. Lett. 85, 2733 (2000)] is studied via a rigorous formalism. It is shown that, contrary to Boto et al.'s heuristic claim, the multiphoton absorption rate of a ``NOON'' quantum state is actua
Externí odkaz:
http://arxiv.org/abs/quant-ph/0607114
Publikováno v:
New J. Phys. 11, 113055 (2009)
We investigate the use of a non-degenerate parametric oscillator (NDPO) as a source for quantum lithography, for which the light can have high-flux and strong non-classical features. This builds on the proposal of Boto, et al. [A. N. Boto, et al., PR
Externí odkaz:
http://arxiv.org/abs/0903.4268
Autor:
Park, Hee Su, Lee, Sun Kyung
We propose a super-resolution quantum lithography scheme based on coherent population trapping in lambda-type atoms coupled to temporally-cascaded standing-wave driving fields. By realizing effective multiplication of optical intensity profiles on an
Externí odkaz:
http://arxiv.org/abs/0806.2175
Autor:
Sciarrino, Fabio, Vitelli, Chiara, De Martini, Francesco, Glasser, Ryan, Cable, Hugo, Dowling, Jonathan P.
Publikováno v:
Phys. Rev. A 77, 012324 (2008)
Quantum lithography proposes to adopt entangled quantum states in order to increase resolution in interferometry. In the present paper we experimentally demonstrate that the output of a high-gain optical parametric amplifier can be intense yet exhibi
Externí odkaz:
http://arxiv.org/abs/0801.3531
Publikováno v:
J. Opt. B Vol. 6, S811-S815 (2004).
We explore the intimate relationship between quantum lithography, Heisenberg-limited parameter estimation and the rate of dynamical evolution of quantum states. We show how both the enhanced accuracy in measurements and the increased resolution in qu
Externí odkaz:
http://arxiv.org/abs/quant-ph/0402083
Publikováno v:
Opt. Express. 12, 6600 (2004)
The smallest spot in optical lithography and microscopy is generally limited by diffraction. Quantum lithography, which utilizes interference between groups of N entangled photons, was recently proposed to beat the diffraction limit by a factor N. He
Externí odkaz:
http://arxiv.org/abs/quant-ph/0411163
Autor:
Cao, De-Zhong, Wang, Kaige
We study the generalized Young's double-slit interference for the beam produced in the spontaneously parametric down-conversion (SPDC). We find that the sub-wavelength lithography can occur macroscopically in both the two-photon intensity measurement
Externí odkaz:
http://arxiv.org/abs/quant-ph/0310046