Výsledky vyhledávání - "Punitha Selvam"

Retargeting-aware design for manufacturability (DFM) checks using machine learning

Autor: Lynn T. N. Wang, Uwe Paul Schroeder, Punitha Selvam, Fadi Salameh Batarseh, Pouya Rezaeifakhr, Ariel de Jesus Reyes Ruiz, Teodora Nicolae, Ivan Tanev, Sriram Madhavan

Publikováno v: DTCO and Computational Patterning.

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::0294b0817b7f623bad62e21463b51049
https://doi.org/10.1117/12.2614460

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An automated system for checking process friendliness and routability of standard cells

Autor: I-Lun Tseng, Chun Ming Tommy Yip, Zhao Chuan Lee, Vikas Tripathi, Jonathan Yoong Seang Ong, Punitha Selvam

Publikováno v: Design-Process-Technology Co-optimization for Manufacturability XIV.

In this paper, we propose methodologies used in a software system for checking process friendliness (including lithography friendliness) and routability (including pin accessibility) of standard cells. In the process of designing physical layouts of

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::a0d92fa9224864a1c7e07a0474e12a84
https://doi.org/10.1117/12.2551981

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Contrast induced Nephropathy and Pelviureteric Junction Obstruction in a patient with Mayer-Rokitansky-Kuster-Hauser Syndrome and Solitary Ectopic Kidney- A case report

Autor: Pearlsy Grace Rajan, Damal Kandadai Sriram, Melvin George, Punitha Selvam, Melina I Sahay

Publikováno v: International Journal of Medical Reviews and Case Reports. :1

MayerRokitanskyKusterHauser (MRKH) syndrome is a rare congenital syndrome with the absence of uterus and vagina, affecting 1 in 5000 women. The patient has normal secondary sexual characters and the first sign of the syndrome is primary amenorr

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::cda7f1910b50cbc410a698fbfd56fc30
https://doi.org/10.5455/ijmrcr.2020-05-192

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Process optimization through model based SRAF printing prediction

Autor: Ramya Viswanathan, Punitha Selvam, Jaione Tirapu Azpiroz

Publikováno v: SPIE Proceedings.

Sub-Resolution Assist Features (SRAFs) are used in optical lithography to improve the manufacturing process window (PW). They are added to the mask shapes to create a denser environment that improves the printability of the target design shapes on wa

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::b659c8ef61884469eaaea6174b81e7e7
https://doi.org/10.1117/12.916731

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