Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Psnsr Srikar"'
Publikováno v:
2021 IEEE International Conference on Plasma Science (ICOPS).
Advanced oxidation process (AOP) is an emerging technology for removing complex organic molecules in water and wastewater treatment and surface disinfection. AOPs rely on the in-situ generation of reactive chemical species (RCS) such as hydroxyl radi
Publikováno v:
2021 IEEE International Conference on Plasma Science (ICOPS).
Surface dielectric barrier discharges (SDBDs) are promising nonthermal plasma systems for industrial-scale operations. These plasmas are scalable, and the plasma operation is relatively unaffected by the characteristics of the target samples. Therefo
Autor:
Lakshminarayana Rao, Psnsr Srikar, P. Leelesh, Anand M. Shivapuji, R. K. Gangwar, Ananthanarasimhan J
Publikováno v:
Journal of Applied Physics. 129:223301
This work reports average electron temperature ( T e) and electron density ( n e) of an atmospheric argon rotating gliding arc ( R G A), operated in glow-type mode, under transitional and turbulent flows. Both T e and n e were calculated near the sho
Autor:
Allabakshi SM; Department of Civil and Environmental Engineering, Indian Institute of Technology Tirupati, Yerpedu 517619, India., Srikar PSNSR; Department of Physics & CAMOST, Indian Institute of Technology Tirupati, Yerpedu 517619, India., Gomosta S; Department of Civil and Environmental Engineering, Indian Institute of Technology Tirupati, Yerpedu 517619, India., Gangwar RK; Department of Physics & CAMOST, Indian Institute of Technology Tirupati, Yerpedu 517619, India. Electronic address: reetesh@iittp.ac.in., Maliyekkal SM; Department of Civil and Environmental Engineering, Indian Institute of Technology Tirupati, Yerpedu 517619, India. Electronic address: shihab@iittp.ac.in.
Publikováno v:
Journal of hazardous materials [J Hazard Mater] 2023 Mar 15; Vol. 446, pp. 130639. Date of Electronic Publication: 2022 Dec 21.