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Autor:
Priscila R. Pessoa, Ednan Joanni, Grazielle de Oliveira Setti, Dosil Pereira de Jesus, Ronei J. Poppi, Mónica B. Mamián-López
Publikováno v:
Applied Surface Science. 347:17-22
Indium Tin oxide (ITO) nanowires were deposited by RF sputtering over oxidized silicon using ITO and Indium targets. The nanowires grew on the substrate with a catalyst layer of Indium by the vapor–liquid–solid (VLS) mechanism. Modifications in t