Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Prasad Kelkar"'
Publikováno v:
Indian journal of otolaryngology and head and neck surgery : official publication of the Association of Otolaryngologists of India. 56(1)
Laryngotracheal stenosis is a partial or complete cicatricial narrowing of endolarynx or trachea. It has became mare common for two reasons; first, increasing prolonged endotracheal intubations for mechanical ventilation, secondly, increase in trauma
Publikováno v:
SPIE Proceedings.
High resolution electron beam lithography poses severe constraints on any suitable resist, namely the need to work with very thin layers in order to achieve highest resolutions, while at the same time possessing suitable resistance to plasma etching.
Publikováno v:
SPIE Proceedings.
Proximity effects during electron beam exposure have been kept under control by using sophisticated correction algorithms and software, combined with a strategy which aims at increasing the electron beam energy to 50 keV and 100 keV. At these energie
Autor:
Eric Lavallee, R. Legario, Jacques Beauvais, Prasad Kelkar, Dominique Drouin, Pan Yang, Lau Kien Mun, Yousef Awad, Pierre Lafrance, David Turcotte, Melanie Cloutier
Publikováno v:
SPIE Proceedings.
A novel and effective approach to nano-fabrication lithography is the vapour deposition of the negative tone electron beam resists QSR-5 and QSR-15 (Quantiscript’s sterol based resist) onto a substrate. Vapour deposition is especially conducive for
Autor:
Prasad Kelkar, R. Legario, Pan Yang, M. Cloutier, D. Drouin, David Turcotte, E. Lavallee, J. Beauvais
Publikováno v:
Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference.
In this paper, the resist is evaporated using conventional thermal evaporation. Thickness as small as 20 nm have been demonstrated, with surface roughness as small as 4 nm rms.
Autor:
Prasad Kelkar, Pan Yang, Lau Kien Mun, Eric Lavallee, Jacques Beauvais, Dominique Drouin, R. Legario, Yousef Awad, Melanie Cloutier, Vincent Aimez, David Turcotte
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 22:743
Semiconductor micro and nanofabrication lithography techniques for application in microelectronics as well as in micromechanics and optoelectronics can gain significantly from using a dry resist process, since it enables the deposition of a very unif
Autor:
Prasad Kelkar, Kien Mun Lau, Melanie Cloutier, Jacques Beauvais, Eric Lavallee, Pan Yang, Yousef Awad, Dominique Drouin, David Turcotte
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 22:1040
A critical issue in fabricating arrays of holes is to achieve high-aspect-ratio structures. Formation of ordered arrays of nanoholes in silicon nitride was investigated by the use of ultrathin hard etch mask formed by nickel pulse reversal plating to