Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Prasad Kelkar"'
Publikováno v:
Indian journal of otolaryngology and head and neck surgery : official publication of the Association of Otolaryngologists of India. 56(1)
Laryngotracheal stenosis is a partial or complete cicatricial narrowing of endolarynx or trachea. It has became mare common for two reasons; first, increasing prolonged endotracheal intubations for mechanical ventilation, secondly, increase in trauma
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f0a3e25c866441a99acdc48e9f86783e
https://pubmed.ncbi.nlm.nih.gov/23120015
https://pubmed.ncbi.nlm.nih.gov/23120015
Publikováno v:
SPIE Proceedings.
High resolution electron beam lithography poses severe constraints on any suitable resist, namely the need to work with very thin layers in order to achieve highest resolutions, while at the same time possessing suitable resistance to plasma etching.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4cbaf9db7da7dd3be4ae81e62177f7f4
https://doi.org/10.1117/12.656823
https://doi.org/10.1117/12.656823
Publikováno v:
SPIE Proceedings.
Proximity effects during electron beam exposure have been kept under control by using sophisticated correction algorithms and software, combined with a strategy which aims at increasing the electron beam energy to 50 keV and 100 keV. At these energie
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c3b86d7cde14f9e2826d716620faa5d2
https://doi.org/10.1117/12.599723
https://doi.org/10.1117/12.599723
Autor:
Prasad Kelkar, R. Legario, Pan Yang, M. Cloutier, D. Drouin, David Turcotte, E. Lavallee, J. Beauvais
Publikováno v:
Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference.
In this paper, the resist is evaporated using conventional thermal evaporation. Thickness as small as 20 nm have been demonstrated, with surface roughness as small as 4 nm rms.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fb3e7dcd2bfa5560f836d9536d6b8381
https://doi.org/10.1109/imnc.2003.1268621
https://doi.org/10.1109/imnc.2003.1268621
Autor:
Prasad Kelkar, Pan Yang, Lau Kien Mun, Eric Lavallee, Jacques Beauvais, Dominique Drouin, R. Legario, Yousef Awad, Melanie Cloutier, Vincent Aimez, David Turcotte
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 22:743
Semiconductor micro and nanofabrication lithography techniques for application in microelectronics as well as in micromechanics and optoelectronics can gain significantly from using a dry resist process, since it enables the deposition of a very unif
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::75c47ac1196eb24c58b0f78045387a50
https://doi.org/10.1116/1.1667503
https://doi.org/10.1116/1.1667503
Autor:
Prasad Kelkar, Kien Mun Lau, Melanie Cloutier, Jacques Beauvais, Eric Lavallee, Pan Yang, Yousef Awad, Dominique Drouin, David Turcotte
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 22:1040
A critical issue in fabricating arrays of holes is to achieve high-aspect-ratio structures. Formation of ordered arrays of nanoholes in silicon nitride was investigated by the use of ultrathin hard etch mask formed by nickel pulse reversal plating to
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d2d1f7703316028c24c59386990d4364
https://doi.org/10.1116/1.1647589
https://doi.org/10.1116/1.1647589