Zobrazeno 1 - 2
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pro vyhledávání: '"Poyo Chuang"'
Autor:
Tsai Bin-Siang, Te-Fu Chang, Wu Hsiao-Che, Ming-Yen Li, Haw Yen, Mei-Yun Su, Tsung-Hsun Yang, Tsai Wen-Li, Poyo Chuang
Publikováno v:
Microelectronic Engineering. 85:1502-1510
TiN/Al-0.5Cu/Ti film stacks deposited on SiO"2 substrate were studied by X-ray diffraction and electron microscopy to clarify the effects of the chamber long stay and post-deposition annealing on the morphology evolution. Experimental results indicat
Publikováno v:
Microelectronic Engineering. 85:126-130
The effect of the plasma operation pressure on the burn-in efficiency of a self-ionized-plasma (SIP) physical vapor deposition (PVD) system for growing TiN liner films was examined. The experiments in this study were designed to obtain the proper pla