Atomic layer deposition of Ge 2Sb 2Te 5 thin films

Autor: Ritala, Mikko, Pore, Viljami, Hatanpää, Timo, Heikkilä, Mikko, Leskelä, Markku, Mizohata, Kenichiro, Schrott, Alejandro, Raoux, Simone, Rossnagel, Stephen M.

Publikováno v: In Microelectronic Engineering 2009 86(7):1946-1949

Atomic layer deposition of TiO 2− xN x thin films for photocatalytic applications

Autor: Pore, Viljami, Heikkilä, Mikko, Ritala, Mikko, Leskelä, Markku, Areva, Sami

Publikováno v: In Journal of Photochemistry & Photobiology, A: Chemistry 2006 177(1):68-75

Characterisation of the Al 2O 3 films deposited by ultrasonic spray pyrolysis and atomic layer deposition methods for passivation of 4H–SiC devices

Autor: Wolborski, Maciej, Bakowski, Mietek, Ortiz, Armando, Pore, Viljami, Schöner, Adolf, Ritala, Mikko, Leskelä, Markku, Hallén, Anders

Publikováno v: In Microelectronics Reliability 2006 46(5):743-755

Atomic Layer Deposition and Photocatalytic Properties of Titanium Dioxide Thin Films

Autor: Pore, Viljami

Photocatalytic TiO2 thin films can be highly useful in many environments and applications. They can be used as self-cleaning coatings on top of glass, tiles and steel to reduce the amount of fouling on these surfaces. Photocatalytic TiO2 surfaces hav

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=od______1593::c8645dca4ba086254e6be5500e899d59
http://hdl.handle.net/10138/21126

Nickel suicide for source-drain contacts from ALD NiO films.

Autor: Pore, Viljami, Tois, Eva, Matero, Raija, Haukka, Suvi, Tuominen, Marko, Woodruff, Jacob, Milligan, Brennan, Tang, Fu, Givens, Michael

Publikováno v: 2015 IEEE International Interconnect Technology Conference & 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM); 2015, p191-194, 4p