Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Ponton, Simon"'
Autor:
Jaud, Alexandre, Ponton, Simon, Sekkat, Abderrahime, Aal, Alsayed Abdel, Sauvage, Thierry, Samelor, Diane, Vergnes, Hugues, Diallo, Babacar, Etzkorn, Johannes, Caussat, Brigitte, Vahlas, Constantin
Publikováno v:
In Surface & Coatings Technology 15 June 2023 462
Autor:
Ponton, Simon, Dhainaut, Franck, Vergnes, Hugues, Samelor, Diane, Sadowski, Daniel, Rouessac, Vincent, Lecoq, Hélène, Sauvage, Thierry, Caussat, Brigitte, Vahlas, Constantin
Publikováno v:
In Journal of Non-Crystalline Solids 1 July 2019 515:34-41
Autor:
Ponton, Simon, Dhainaut, Franck, Vergnes, Hugues, Caussat, Brigitte, Samélor, Diane, Sadowski, Daniel, Vahlas, Constantin
Depuis les années 80, l’élaboration de couches minces de silice, SiO2 à partir d’orthosilicate de tétraéthyle ((Si(OC2H5)4, TEOS) par dépôt chimique en phase vapeur (CVD) a été largement étudiée pour répondre aux problématiques de la
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::0517a5f2d41d240625209c4657f618bd
https://oatao.univ-toulouse.fr/21795/
https://oatao.univ-toulouse.fr/21795/
Autor:
Ponton, Simon, Vergnes, Hugues, Samelor, Diane, Samélor, Diane, Sadowski, Daniel, Vahlas, Constantin, Caussat, Brigitte
Publikováno v:
AIChE Journal
AIChE Journal, Wiley, 2018, ⟨10.1002/aic.16222⟩
AIChE Journal, Wiley, 2018, 00, pp.1-9. ⟨10.1002/aic.16222⟩
AIChE Journal, Wiley, 2018, ⟨10.1002/aic.16222⟩
AIChE Journal, Wiley, 2018, 00, pp.1-9. ⟨10.1002/aic.16222⟩
International audience; An apparent kinetic model for the chemical vapor deposition of SiO 2 from tetraethyl orthosilicate (TEOS) and O 2 was developed in a poorly investigated range of operating conditions, that is, at atmospheric pressure and betwe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2cead0b364bdfdcd1d3dae165c713ac5
https://oatao.univ-toulouse.fr/20815/
https://oatao.univ-toulouse.fr/20815/
Autor:
Ponton, Simon, Dhainaut, Franck, Vergnes, Hugues, Caussat, Brigitte, Samélor, Diane, Sadowski, Daniel, Vahlas, Constantin
Chemical vapor deposited SiO2 films from tetraethyl orthosilicate (TEOS) is a key enabling material in numerous applications. Among the several pathways for the CVD of SiO2 films from TEOS, the poorly investigated medium temperature process involving
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::920bf5f81fd8d3f8c127f0f4d0d424f2
https://oatao.univ-toulouse.fr/21803/
https://oatao.univ-toulouse.fr/21803/
Autor:
Vergnes, Hugues, Caussat, Brigitte, Ponton, Simon, Samelor, Diane, Sadowski, Daniel, Vahlas, Constantin
Publikováno v:
AIChE Journal; Nov2018, Vol. 64 Issue 11, p3958-3966, 9p
Autor:
Topka, Konstantina Christina, Diallo, Babacar, Puyo, Maxime, Chesneau, Erwan, Inoubli, Farah, Ponton, Simon, Genevois, Cecile, Samelor, Diane, Laloo, Raphael, Sadowski, Daniel, Charvillat, Cédric, Teramoto, Takashi, Senocq, François, Sauvage, Thierry, Vergnes, Hugues, Menu, Marie-Joelle, Dussarrat, Christian, Caussat, Brigitte, Turq, Viviane, Vahlas, Constantin, Pellerin, Nadia
Publikováno v:
ACS Applied EngineeringMaterials; 20230101, Issue: Preprints