Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Po-shin Lee"'
Publikováno v:
Aerosol and Air Quality Research. 10:1-7
The technology roadmap toward smaller structures and thinner layers in semiconductor manufacturing directs attention more and more toward yield-affecting influences from the air quality of manufacturing environment such as water vapor, O2, CO2 etc. t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::52360b2725e42e1cb37bce2104fbac73
https://doi.org/10.4209/aaqr.2009.01.0007
https://doi.org/10.4209/aaqr.2009.01.0007
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXIII.
The control of haze contamination on reticles has been gaining an ever-increasing focus because of its contribution to the huge yield loss in semiconductor manufacturing. Yield improvement through the reduction of haze on reticles has been a signific
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c75c28c6ceb40bf77719e4014dc17d58
https://doi.org/10.1117/12.813998
https://doi.org/10.1117/12.813998
Publikováno v:
SPIE Proceedings.
Various studies have been published on the formation and prevention of reticle haze; however, yield loss due to reticle haze is still an issue for most of the IC makers. For a mass production IC manufacturing fab, an easy and practical solution is ne
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1a202e2abc75f595ef686f13501530aa
https://doi.org/10.1117/12.804629
https://doi.org/10.1117/12.804629
Publikováno v:
SPIE Proceedings.
Haze is a kind of contamination on the surface of mask which observed in the wafer production clean room only on reticles exposed with 193nm or 248nm wavelength process. Analyses have been provided an approach with enhance reticle purging efficiency
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::179ebedc16c866f12ae96d92696b9ba6
https://doi.org/10.1117/12.798454
https://doi.org/10.1117/12.798454