Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Ping Linda Zhang"'
Publikováno v:
2021 China Semiconductor Technology International Conference (CSTIC).
Chlorine-based plasma of BCl3/CCl4 etc. was applied to dry-etch PVD sputtered 1.2µm aluminum alloy with Al-Si-Cu 98%-1%-1%. AZ-1500 resist acted as the etching mask for Al. XRD of alloy with annealing temperature of 300°C, 400°C on TEOS oxide and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2d459b3aa0a713a80a5a2138235e03c8
https://doi.org/10.1109/cstic52283.2021.9461590
https://doi.org/10.1109/cstic52283.2021.9461590
Publikováno v:
ECS Transactions. 34:365-370
X-ray diffraction of antimony doped single crystal (100) surface with the concentration of 1.4~4.7x1018/cm3 is reported. The lattice constant is the same as Si. The anisotropic etching changed the very top fourfold rotational symmetrical (100) surfac
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5a46a47e8bde439f66e05fbeea8c9b20
https://doi.org/10.1149/1.3567605
https://doi.org/10.1149/1.3567605
Autor:
Ping Linda Zhang, Zhong Yuan Jin, Lu Chuan Zhang, Song Hu, Hai Liang Yu, Li Yu Liu, Yong Yang, Le Wang
Publikováno v:
SPIE Proceedings.
With decreasing CD in semiconductor industry, the ability to detect smaller resist particles on wafers after photolithography process becomes increasingly important for the advanced photolithography processes. It is important to be able to detect the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::231c7a33ead1958ce616433ec7c2b4c2
https://doi.org/10.1117/12.782960
https://doi.org/10.1117/12.782960
Publikováno v:
SPIE Proceedings.
Modulation Transfer Function (MTF) for the aerial image formation and Critical Modulation Transfer Function (CMTF) from the image formation system are two most important parameters for the photolithography processes. In this paper, we studied CMTF, o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::121d7573099d62b37a28c7c9c2e09fe1
https://doi.org/10.1117/12.782963
https://doi.org/10.1117/12.782963
Publikováno v:
2007 International Workshop on Electron Devices and Semiconductor Technology (EDST).
Magnetron Physical Vapor Deposition of Aluminum (Al) on single crystal Si (111) at 400 ° C and on oxide at the room temperature are studied by x-ray diffraction and the field-emission scanning electron microscopy. We focused our study on aluminum gr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::44fa8790e70d3981862a31da62f902a9
https://doi.org/10.1109/edst.2007.4289790
https://doi.org/10.1109/edst.2007.4289790
Publikováno v:
SPIE Proceedings.
Historically diazoquinone/novolak- the two-component photosensitive material (photoresist) was efficiently used in various industries. In the semiconductor industry it is used for the high contrast, high resolution binary image formation for the inte
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a7bc7274df5ea01a33facdb2b5f2ba00
https://doi.org/10.1117/12.725214
https://doi.org/10.1117/12.725214