Zobrazeno 1 - 10
of 20
pro vyhledávání: '"Pin-Hsu Kao"'
Publikováno v:
Sensors, Vol 10, Iss 2, Pp 1315-1325 (2010)
This work presents a thermoelectric micro generator fabricated by the commercial 0.35 μm complementary metal oxide semiconductor (CMOS) process and the post-CMOS process. The micro generator is composed of 24 thermocouples in series. Each thermocoup
Externí odkaz:
https://doaj.org/article/e0a207265bc147a28d4dc38f802c42c1
Publikováno v:
Sensors, Vol 9, Iss 8, Pp 6219-6231 (2009)
In this study we used the commercial 0.35 µm CMOS (complementary metal oxide semiconductor) process and simple maskless post-processing to fabricate an array of micromirrors exhibiting high natural frequency. The micromirrors were manufactured from
Externí odkaz:
https://doaj.org/article/f76919ae491f40ed8fad954237006261
Publikováno v:
Sensors, Vol 9, Iss 3, Pp 2062-2075 (2009)
This study presents the fabrication and characterization of a micromechanical tunable in-plane resonator. The resonator is manufactured using the commercial 0.35 µm complementary metal oxide semiconductor (CMOS) process. The resonator is made of alu
Externí odkaz:
https://doaj.org/article/3f8e2481ecdb43569ed27a41fc31e590
Publikováno v:
Sensors, Vol 7, Iss 12, Pp 3386-3398 (2007)
This paper presents the simulation, fabrication and characterization of a microFET (field effect transistor) pressure sensor with readout circuits. The pressure sensorincludes 16 sensing cells in parallel. Each sensing cell that is circular shape is
Externí odkaz:
https://doaj.org/article/d3e4ea128fae409bb91010e09d4199c3
Autor:
Pin-Hsu Kao, 高斌栩
98
This study used the commercial 0.35 µm CMOS (complementary metal oxide semiconductor) process and a simple maskless post-process to fabricate an array of micromirrors which is applied on the confocal microscopy system and a tunable resonator
This study used the commercial 0.35 µm CMOS (complementary metal oxide semiconductor) process and a simple maskless post-process to fabricate an array of micromirrors which is applied on the confocal microscopy system and a tunable resonator
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/45288961711340182089
Autor:
Pin-Hsu Kao1 d9461402@mail.nchu.edu.tw, Ching-Liang Dai1 cldai@dragon.nchu.edu.tw, Cheng-Chih Hsu2 cchsu@saturn.yzu.edu.tw, Chyan-Chyi Wu3 ccwu@mail.tku.edu.tw
Publikováno v:
Sensors (14248220). 2009, Vol. 9 Issue 8, p6219-6231. 13p. 1 Color Photograph, 1 Black and White Photograph, 3 Diagrams, 2 Charts, 5 Graphs.
Autor:
Pin-Hsu Kao1 d9461402@mail.nchu.edu.tw, Ching-Liang Dai1 cldai@dragon.nchu.edu.tw, Cheng-Chih Hsu2 cchsu@saturn.yzu.edu.tw, Chi-Yuan Lee3 cylee@saturn.yzu.edu.tw
Publikováno v:
Sensors (14248220). 2009, Vol. 9 Issue 3, p2062-2075. 14p. 1 Color Photograph, 1 Black and White Photograph, 6 Diagrams, 6 Graphs.
Publikováno v:
Sensors (Basel, Switzerland)
Sensors; Volume 9; Issue 8; Pages: 6219-6231
Sensors, Vol 9, Iss 8, Pp 6219-6231 (2009)
Sensors; Volume 9; Issue 8; Pages: 6219-6231
Sensors, Vol 9, Iss 8, Pp 6219-6231 (2009)
In this study we used the commercial 0.35 µm CMOS (complementary metal oxide semiconductor) process and simple maskless post-processing to fabricate an array of micromirrors exhibiting high natural frequency. The micromirrors were manufactured from
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f3e181059550fa71ede030d3e18b289d
http://europepmc.org/articles/PMC3312440
http://europepmc.org/articles/PMC3312440
Publikováno v:
Microelectronics Journal. 39:744-749
The fabrication of a micro field effect transistor (FET) pressure sensor using the commercial [email protected] complementary metal oxide semiconductor (CMOS) process and a post-process has been investigated. The pressure sensor is composed of 16 sen
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::27041465a096988c3b0c844cd89cad0d
https://doi.org/10.1016/j.mejo.2007.12.015
https://doi.org/10.1016/j.mejo.2007.12.015
Publikováno v:
Nanoscale. 6(16)
Broadband antireflection and field emission characteristics of silicon nanopillars (Si-NPs) fabricated by self-masking dry etching in hydrogen-containing plasma were systematically investigated. In particular, the effects of ultrathin (5–20 nm) tit
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6c3fb6c9b4a408912fed65f87fcd9c22
https://pubmed.ncbi.nlm.nih.gov/25029029
https://pubmed.ncbi.nlm.nih.gov/25029029