Zobrazeno 1 - 10
of 45
pro vyhledávání: '"Pilvi, Tero"'
Publikováno v:
In Polyhedron 2010 29(7):1754-1759
Akademický článek
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Autor:
Jefimovs, Konstantins, Laukkanen, Janne, Vallius, Tuomas, Pilvi, Tero, Ritala, Mikko, Meilahti, Tomi, Kaipiainen, Matti, Bavdaz, Marcos, Leskelä, Markku, Turunen, Jari
Publikováno v:
In Microelectronic Engineering 2006 83(4):1339-1342
Autor:
Kukli, Kaupo *, Ritala, Mikko, Pilvi, Tero, Aaltonen, Titta, Aarik, Jaan, Lautala, Markus, Leskelä, Markku
Publikováno v:
In Materials Science & Engineering B 2005 118(1):112-116
Atomic layer deposition of hafnium dioxide thin films from hafnium tetrakis(dimethylamide) and water
Publikováno v:
In Thin Solid Films 2005 491(1):328-338
Publikováno v:
Ritasalo, R, Ylivaara, O M E, Pilvi, T, Suni, T & Veselov, A 2019, ' Stresses in ALD films : aiming for zero stress thin films ', 14th International conference on Films and Coatings 2019, St. Petersburg, Russian Federation, 14/05/19-16/05/19 .
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=355e65625b88::254bc69b48b831e009a4ea709e4e9906
https://cris.vtt.fi/en/publications/b940f211-bb1d-48f4-8752-a877f6e5f241
https://cris.vtt.fi/en/publications/b940f211-bb1d-48f4-8752-a877f6e5f241
Publikováno v:
Ritasalo, R, Ylivaara, O, Pilvi, T & Suni, T 2018, ' Stresses in ALD films : Aiming for zero stress thin films ', 4th International Conference on ALD Applications and 2018 China ALD Conference, CALD2018, Shenzhen, China, 14/10/18-17/10/18 .
Ritasalo, R, Ylivaara, O, Pilvi, T & Suni, T 2018, ' Stresses in ALD films : Aiming for zero stress thin films ', 18th International Conference on Atomic Layer Deposition, ALD/ALE 2018, Incheon, Korea, Republic of, 29/07/18-1/08/18 pp. 49 . < https://ald2018.avs.org/wp-content/uploads/2018/07/ALD-ALE-2018-Schedule.pdf >
Ritasalo, R, Ylivaara, O, Pilvi, T & Suni, T 2018, ' Stresses in ALD films : Aiming for zero stress thin films ', 18th International Conference on Atomic Layer Deposition, ALD/ALE 2018, Incheon, Korea, Republic of, 29/07/18-1/08/18 pp. 49 . < https://ald2018.avs.org/wp-content/uploads/2018/07/ALD-ALE-2018-Schedule.pdf >
When grown films by atomic layer deposition (ALD) both intrinsic and thermal stresses are formed into the film; latter due to the mismatch in the thermal expansion coefficient of the substrate and the grown film. Films under high residual stress may
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::ec9fabdda9d8216038ef0a18209a8c79
https://cris.vtt.fi/en/publications/1ffb1361-5d2a-45e0-a319-63574c0d6567
https://cris.vtt.fi/en/publications/1ffb1361-5d2a-45e0-a319-63574c0d6567
Autor:
Kräuter, Gertrud, Eberhardt, Angela, Peskoller, Florian, Güldal, Nusret Sena, Lell, Alfred, Ritasalo, Riina, Pilvi, Tero, Römer, Manfred, Domann, Gerhard, Löbmann, Peer
Publikováno v:
Journal of Sol-Gel Science & Technology; 2021, Vol. 97 Issue 2, p458-465, 8p
Autor:
Pilvi, Tero
Thin films of various metal fluorides are suited for optical coatings from infrared (IR) to ultraviolet (UV) range due to their excellent light transmission. In this work, novel metal fluoride processes have been developed for atomic layer deposition
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=od______1593::ee65de16f376eb05bfe2f583266718c0
http://hdl.handle.net/10138/21109
http://hdl.handle.net/10138/21109
Akademický článek
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