Nondipole circularly polarized laser-assisted photoelectron emission

Autor: Della Picca, R., Randazzo, J. M., López, S. D., Ciappina, M. F., Arbó, D. G.

We theoretically study atomic laser-assisted photoelectric emission (LAPE) beyond the electric dipole approximation. We present a theoretical description for first-order nondipole corrections ($O(c^{-1})$ where $c$ is the speed of light) to the nonre

Externí odkaz: http://arxiv.org/abs/2412.19378

Electron emission perpendicular to polarization direction in laser assisted XUV atomic ionization

Autor: Gramajo, A. A., Della Picca, R., Arbó, D. G.

Publikováno v: Phys. Rev. A 96, 023414 (2017)

We present a theoretical study of ionization of the hydrogen atom due to an XUV pulse in the presence of an IR laser with both fields linearly polarized in the same direction. In particular, we study the energy distribution of photoelectrons emitted

Externí odkaz: http://arxiv.org/abs/1703.09585

Crystallographic orientation and induced potential effects in photoelectron emission from metal surfaces by ultrashort laser pulses

Autor: Rubiano, C. A. Rios, Della Picca, R., Mitnik, D. M., Silkin, V. M., Gravielle, M. S.

Publikováno v: Phys. Rev. A 95, 033401 (2017)

The influence of the crystallographic orientation of a typical metal surface, like aluminum, on electron emission spectra produced by grazing incidence of ultrashort laser pulses is investigated by using the band-structure-based-Volkov (BSB-V) approx

Externí odkaz: http://arxiv.org/abs/1609.08932

Theory of high-order harmonic generation from molecules by intense laser pulses

Autor: Le, Anh-Thu, Della Picca, R., Fainstein, P. D., Telnov, D. A., Lein, M., Lin, C. D.

Publikováno v: J. Phys. B: At. Mol. Opt. Phys. 41, 081002 (2008)

We show that high-order harmonics generated from molecules by intense laser pulses can be expressed as the product of a returning electron wave packet and the photo-recombination cross section (PRCS) where the electron wave packet can be obtained fro

Externí odkaz: http://arxiv.org/abs/0802.2301

Operando SXRD of E-ALD deposited sulphides ultra-thin films: Crystallite strain and size

Autor: Giaccherini A.[1], Russo F.[1], Carlà F.[2], Guerri A.[1], Picca R.[3], Cioffi N.[3], Cinotti S.[1], Montegrossi G.[4], Passaponti M.[1], Di Benedetto F.[3, Felici R.[6], Innocenti M. [1]

Publikováno v: Applied surface science 432 (2018): 53–59. doi:10.1016/j.apsusc.2017.07.294
info:cnr-pdr/source/autori:Giaccherini A.[1], Russo F.[1], Carlà F.[2], Guerri A.[1], Picca R.[3], Cioffi N.[3], Cinotti S.[1], Montegrossi G.[4], Passaponti M.[1], Di Benedetto F.[3,4], Felici R.[6], Innocenti M. [1]/titolo:Operando SXRD of E-ALD deposited sulphides ultra-thin films: Crystallite strain and size/doi:10.1016%2Fj.apsusc.2017.07.294/rivista:Applied surface science/anno:2018/pagina_da:53/pagina_a:59/intervallo_pagine:53–59/volume:432

Electrochemical Atomic Layer Deposition (E-ALD), exploiting surface limited electrodeposition of atomic layers, can easily grow highly ordered ultra-thin films and 2D structures. Among other compounds Cu x Zn y S grown by means of E-ALD on Ag(111) ha

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::451e8aba9e8ae2e0b0388d7ebbc37084
https://doi.org/10.1016/j.apsusc.2017.07.294