Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Pia Myllymäki"'
Autor:
Lauri Niinistö, Pia Myllymäki, D. G. Schlom, Jürgen Schubert, A. Besmehn, Uffe Littmark, Siegfried Mantl, M. Roeckerath, Joao Marcelo J. Lopes, Carolina Adamo, Tassilo Heeg
Publikováno v:
ECS Transactions. 11:311-318
Lanthanum lutetium oxide thin films have been grown on Si substrates by three different techniques: pulsed-laser deposition, molecular beam deposition, and atomic layer deposition. Post-deposition annealing in O2 was performed to improve their electr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f80ee5585ceb81f295a330fb3d08d236
https://doi.org/10.1149/1.2779570
https://doi.org/10.1149/1.2779570
Autor:
Matti Putkonen, M. Roeckerath, S. Mantl, Lauri Niinistö, S. Lenk, Jürgen Schubert, Pia Myllymäki
Publikováno v:
University of Helsinki
Gadolinium scandium oxide (Gd-scandate, GdScO3) thin films were grown by atomic layer deposition (ALD) from β-diketonate precursors M(thd)3 (M=Gd, Sc; thd=2,2,6,6-tetramethyl-3,5-heptanedionato) and ozone. The deposition parameters were optimized to
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::183950af4514bc53132f87340075b077
https://doi.org/10.1007/s00339-007-4069-7
https://doi.org/10.1007/s00339-007-4069-7
Autor:
Pia Myllymäki, Charles H. Winter, Lauri Niinistö, Kai Arstila, Charles L. Dezelah, Jani Päiväsaari
Publikováno v:
J. Mater. Chem.. 17:1308-1315
The atomic layer deposition (ALD) growth of ErxGa2−xO3 (0 ≤ x ≤ 2) thin films was demonstrated using two precursor systems: Er(thd)3, Ga(acac)3, and ozone and Er(C5H4Me)3, Ga2(NMe2)6, and water at substrate temperatures of 350 and 250 °C, resp
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::92fcb9f58406a9f4f64a3fdf06af86c2
https://doi.org/10.1039/b616443a
https://doi.org/10.1039/b616443a
Publikováno v:
J. Mater. Chem.. 16:563-569
Amorphous YScO3 thin films have been deposited by atomic layer deposition using two types of volatile metal precursors, viz. β-diketonate-type metal complexes M(thd)3 (M = Y, Sc; thd = 2,2,6,6-tetramethyl-3,5-heptanedionato) and organometallic cyclo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::395d5f8a23b5558aa99b27e4d11e13e0
https://doi.org/10.1039/b514083h
https://doi.org/10.1039/b514083h
Autor:
Jürgen Schubert, S. Mantl, Pia Myllymäki, Joao Marcelo J. Lopes, M. Roeckerath, Lauri Niinistö, A. Besmehn, Tassilo Heeg
Publikováno v:
Thin Solid Films. 517:201-203
LaLuO 3 thin films have been deposited with atomic layer deposition on Si substrates using β-diketonate compounds for the rare earth metals and ozone as the oxygen source. Subsequently, the films were investigated regarding their chemical compositio
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5d3e71be3362eceaec3b0156e92ca7e7
https://doi.org/10.1016/j.tsf.2008.08.064
https://doi.org/10.1016/j.tsf.2008.08.064
Autor:
Jani Päiväsaari, Minna Nieminen, Pia Myllymäki, Jaakko Niinistö, Matti Putkonen, Chuck Dezelah, Lauri Niinistö, Charles H. Winter
Publikováno v:
Topics in Applied Physics ISBN: 9783540357964
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::94e7aade7a49a6c042c00a51e2caeba9
https://doi.org/10.1007/11499893_2
https://doi.org/10.1007/11499893_2
Autor:
Pia Myllymäki, Martin Roeckerath, Joao Marcelo Lopes, Jürgen Schubert, Kenichiro Mizohata, Matti Putkonen, Lauri Niinistö
Publikováno v:
Journal of Materials Chemistry; 5/28/2010, Vol. 20 Issue 20, p4207-4212, 6p
Autor:
Charles L. Dezelah, Pia Myllymäki, Jani Päiväsaari, Kai Arstila, Lauri Niinistö, Charles H. Winter
Publikováno v:
Journal of Materials Chemistry; Mar2007, Vol. 17 Issue 13, p1308-1315, 8p
Publikováno v:
Journal of Materials Chemistry; Jan2006, Vol. 16 Issue 6, p563-569, 7p