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pro vyhledávání: '"Phister MR"'
Autor:
Verma PK; Department of Chemical Engineering, University of Virginia, Charlottesville, Virginia 22904, United States., Koellner CA; Department of Chemistry, University of Virginia, Charlottesville, Virginia 22904, United States., Hall H; Department of Chemical Engineering, University of Virginia, Charlottesville, Virginia 22904, United States., Phister MR; Department of Chemical Engineering, University of Virginia, Charlottesville, Virginia 22904, United States., Stone KH; Stanford Synchrotron Radiation Lightsource, SLAC National Accelerator Laboratory, Menlo Park, California 94025, United States., Nichols AW; Department of Chemistry, University of Virginia, Charlottesville, Virginia 22904, United States., Dhakal A; Department of Chemical Engineering, University of Virginia, Charlottesville, Virginia 22904, United States., Ashcraft E; Department of Chemistry, University of Virginia, Charlottesville, Virginia 22904, United States., Machan CW; Department of Chemistry, University of Virginia, Charlottesville, Virginia 22904, United States., Giri G; Department of Chemical Engineering, University of Virginia, Charlottesville, Virginia 22904, United States.
Publikováno v:
ACS applied materials & interfaces [ACS Appl Mater Interfaces] 2023 Nov 22; Vol. 15 (46), pp. 53913-53923. Date of Electronic Publication: 2023 Nov 13.