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Autor:
Aseem Srivastava, Carlo Waldfried, Ivan Berry, Dwight Roh, Shijian Luo, Orlando Escorcia, Phillip Geissbühler
Publikováno v:
ECS Transactions. 34:433-438
This paper reports on the techniques employed to control the re-deposition of the partially dissociated organic photoresist (PR) by-products in advanced non-oxidizing strip processes developed to meet the PR removal requirements of future technology