Zobrazeno 1 - 10
of 52
pro vyhledávání: '"Phillip D. Hustad"'
Autor:
Glenn H. Fredrickson, Nicolas J. Treat, Edward J. Kramer, Phillip D. Hustad, Yingdong Luo, Damien Montarnal, Matthew D. Christianson, Craig J. Hawker
Publikováno v:
ACS Macro Letters
ACS Macro Letters, Washington, D.C : American Chemical Society, 2015, 4 (12), pp.1332--1336
ACS Macro Letters, Washington, D.C : American Chemical Society, 2015, 4 (12), pp.1332--1336
In addition to the traditional parameters of chi (χ) and degree of polymerization (N), we demonstrate that the segregation strength of a diblock copolymer can be increased by introduction of an ionic unit at the junction of the two blocks. Compared
Publikováno v:
Chemical Communications. 54:9478-9481
Polyelectrolyte multilayer films (PEMs) are conventionally prepared by a layer-by-layer (LbL) deposition of alternating polycation and polyanion solutions. We introduce herein a block copolymer (BCP) approach employing a BCP with an H-bond acceptor b
Publikováno v:
MRS Advances. 1:1829-1839
Directed self-assembly (DSA) of block copolymers is a promising alternative nanolithographic technology aimed at producing sub-40 nm patterns. One important opportunity for DSA is the creation of periodic arrays of lines and spaces. The two most comm
Autor:
Weichao Shi, Damien Montarnal, Craig J. Hawker, Glenn H. Fredrickson, Yingdong Luo, Christian W. Pester, Edward J. Kramer, Matthew D. Christianson, Katherine P. Barteau, Phillip D. Hustad, Sangwon Kim
Publikováno v:
Macromolecules. 48:3422-3430
We report herein the modular synthesis and nanolithographic potential of poly(dimethylsiloxane-block-methyl methacrylate) (PDMS-b-PMMA) with self-assembled domains approaching sub-10 nm periods. A straightforward and modular coupling strategy, optimi
Publikováno v:
Advances in Patterning Materials and Processes XXXIV.
A continuing goal in integrated circuit industry is to increase density of features within patterned masks. One pathway being used by the device manufacturers for patterning beyond the ~80nm pitch limitation of 193 immersion lithography is the self-a
Autor:
Will R. Gutekunst, Athina Anastasaki, Carolin Fleischmann, Craig J. Hawker, Paul G. Clark, Alaina J. McGrath, Phillip D. Hustad, David S. Laitar
Publikováno v:
Journal of polymer science. Part A, Polymer chemistry, vol 55, iss 9
A straightforward and efficient synthetic method that transforms poly(methyl methacrylate) (PMMA) into value-added materials is presented. Specifically, PMMA is modified by transesterification to produce a variety of functional copolymers from a sing
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::77678fd089b739492daad17d0149188a
https://escholarship.org/uc/item/6t63463v
https://escholarship.org/uc/item/6t63463v
Publikováno v:
Journal of Photopolymer Science and Technology. 26:817-823
Autor:
Raghunath Roy, Christopher James Lee, Jieqian Zhang, Daniel J. Murray, Rahul Sharma, Jeffrey D. Weinhold, Phillip D. Hustad, Mingqi Li, Johna W. Kramer, Jong Keun Park, Valeriy V. Ginzburg, Shih-Wei Chang, Peter Trefonas
Publikováno v:
Journal of Photopolymer Science and Technology. 26:31-37
Publikováno v:
Nano letters. 16(1)
Directed self-assembly (DSA) of block copolymers (BCPs) is an attractive advanced patterning technology being considered for future integrated circuit manufacturing. By controlling interfacial interactions, self-assembled microdomains in thin films o
Publikováno v:
Macromolecules. 43:4761-4770
The morphologies of polydisperse ethylene−octene diblock copolymers, synthesized via a novel coordinative chain transfer polymerization process, are examined using two-dimensional synchrotron small...