Zobrazeno 1 - 10
of 16
pro vyhledávání: '"Philip S. Williams"'
Autor:
Erinn C. Dandley, Gregory N. Parsons, Grant T. Hill, Craig D. Needham, Dennis T. Lee, Philip S. Williams, Christopher J. Oldham
Publikováno v:
The Journal of Physical Chemistry C. 123:16146-16152
The sequential vapor infiltration (SVI) method, based on atomic layer deposition chemistry, allows the creation of a polymer–inorganic hybrid material through the diffusion of metal–organic vapor reagents into a polymer substrate. This study inve
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::42ede6f525db81f2687c639f1b28ccb8
https://doi.org/10.1021/acs.jpcc.9b02153
https://doi.org/10.1021/acs.jpcc.9b02153
Publikováno v:
Organic Letters. 19:3907-3910
The synthesis of the briarane-brianthein A core has been accomplished utilizing an extension of the dianionic Ireland-Claisen rearrangement to establish the C1 quaternary carbon and the adjacent C10 ring juncture stereocenters. Two sequential ring-cl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::93e0df967d2075ee1e32f52b3ecd877a
https://doi.org/10.1021/acs.orglett.7b01806
https://doi.org/10.1021/acs.orglett.7b01806
Autor:
James S. Daubert, Jennifer S. Ovental, Philip S. Williams, Hannah N. Gotsch, Christopher J. Oldham, Grant T. Hill, Antoine P. Gremaud, Gregory N. Parsons
Publikováno v:
ACS Applied Materials & Interfaces. 9:4192-4201
Atomic layer deposition (ALD) is a viable means to add corrosion protection to copper metal. Ultrathin films of Al2O3, TiO2, ZnO, HfO2, and ZrO2 were deposited on copper metal using ALD, and their corrosion protection properties were measured using e
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c644f8a52582454c1e1c74b60c567b06
https://doi.org/10.1021/acsami.6b13571
https://doi.org/10.1021/acsami.6b13571
Autor:
Mark D. Losego, Gregory N. Parsons, Gregory W. Peterson, Paul C. Lemaire, Sarah D. Shepherd, Philip S. Williams, Junjie Zhao, Howard J. Walls
Publikováno v:
ACS Applied Materials & Interfaces. 8:9514-9522
Chemically functional microporous metal-organic framework (MOF) crystals are attractive for filtration and gas storage applications, and recent results show that they can be immobilized on high surface area substrates, such as fiber mats. However, fu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::39bdda6f73d593dc3f144b56e109ab3d
https://doi.org/10.1021/acsami.6b01195
https://doi.org/10.1021/acsami.6b01195
Autor:
Philip S. Williams, Christopher J. Oldham, Mark D. Losego, Paul C. Lemaire, Matthew A. Browe, Sarah D. Shepherd, Gregory N. Parsons, Bo Gong, Gregory W. Peterson, Fahim I. Sidi, Junjie Zhao, Howard J. Walls, William T. Nunn, Eric Stevens
Publikováno v:
Journal of Materials Chemistry A. 3:1458-1464
Integration of metal–organic frameworks (MOFs) on textiles shows promise for enabling facile deployment and expanding MOF applications. While MOFs deposited on flat substrates can show relatively smooth surface texture, most previous reports of MOF
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dfc71c53cd9cbb5c9a68a6a0f85c49f9
https://doi.org/10.1039/c4ta05501b
https://doi.org/10.1039/c4ta05501b
Autor:
James S, Daubert, Grant T, Hill, Hannah N, Gotsch, Antoine P, Gremaud, Jennifer S, Ovental, Philip S, Williams, Christopher J, Oldham, Gregory N, Parsons
Publikováno v:
ACS applied materialsinterfaces. 9(4)
Atomic layer deposition (ALD) is a viable means to add corrosion protection to copper metal. Ultrathin films of Al
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=pmid________::11131da95c0c960c92e89272f050b5ee
https://pubmed.ncbi.nlm.nih.gov/28098440
https://pubmed.ncbi.nlm.nih.gov/28098440
Autor:
Gregory N. Parsons, Philip S. Williams, Sarah E. Atanasov, Edward Sachet, Bo Gong, Jon Paul Maria, Mark D. Losego
Publikováno v:
Chemistry of Materials. 26:3471-3478
This work introduces oxidative molecular layer deposition (oMLD) as a chemical route to synthesize highly conductive and conformal poly(3,4-ethylenedioxythiophene) (PEDOT) thin films via sequential vapor exposures of molybdenum(V) chloride (MoCl5, ox
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e718c409a9db6f6c87d6dd1ae791ed07
https://doi.org/10.1021/cm500825b
https://doi.org/10.1021/cm500825b
Publikováno v:
Organic Letters
A dianionic Ireland-Claisen rearrangement of chiral, nonracemic α-methyl-β-hydroxy allylic esters has been developed that proceeds with high diastereoselectivity and provides products containing three contiguous stereogenic carbons, including a qua
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::03b53ccc65105e8d3bcfea0dc06dc23c
https://doi.org/10.1021/ol5008422
https://doi.org/10.1021/ol5008422
Autor:
Joseph C. Spagnola, Gregory N. Parsons, Erinn C. Dandley, Qing Peng, Bo Gong, Christopher J. Oldham, Kyoungmi Lee, Jesse S. Jur, Sarah E. Atanasov, Philip S. Williams, Christina K. Devine
Publikováno v:
Coordination Chemistry Reviews. 257:3323-3331
There is significant growing interest in atomic layer deposition onto polymers for barrier coatings, nanoscale templates, surface modification layers and other applications. The ability to control the reaction between ALD precursors and polymers open
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::669f8223362ec33a196fd8187fab5dde
https://doi.org/10.1016/j.ccr.2013.07.001
https://doi.org/10.1016/j.ccr.2013.07.001
Autor:
Zach Mundy, Gregory N. Parsons, Philip S. Williams, Robert Lawrence Ives, Valery Dolgashev, Christopher J. Oldham
In the Phase I program, Calabazas Creek Research, Inc. (CCR), in collaboration with North Carolina State University (NCSU), fabricated copper accelerator cavities and used Atomic Layer Deposition (ALD) to apply thin metal coatings of tungsten and pla
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::99e30d1851013fec1f4a64ab5b572f73
https://doi.org/10.2172/1165161
https://doi.org/10.2172/1165161
