Zobrazeno 1 - 1
of 1
pro vyhledávání: '"Phil Strenski"'
Autor:
Young O. Kim, Emily Gallagher, Yuri Granik, Kafai Lai, Daniele Paolo Scarpazza, Nick Cobb, Tom Faure, Lei Zhuang, Saeed Bagheri, Alan E. Rosenbluth, Greg McIntyre, Laszlo Ladanyi, Andreas Waechter, Geoffrey W. Burr, Moutaz Fakhry, Michael Lam, Francisco Barahona, Jason E. Meiring, Kehan Tian, David O. S. Melville, Aasutosh Dave, Phil Strenski, Jon Lee, Jaione Tirapu-Azpiroz, Alexander Tritchkov, Hidemasa Muta, Masaharu Sakamoto, Tadanobu Inoue, Azalia A. Krasnoperova, Gabriel Berger, Alfred Wagner, Kostas Adam, Mike Hibbs, Daniel Corliss, Scott Halle
Publikováno v:
SPIE Proceedings.
In recent years the potential of Source-Mask Optimization (SMO) as an enabling technology for 22nm-and-beyond lithography has been explored and documented in the literature.1-5 It has been shown that intensive optimization of the fundamental degrees
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8973f93c622631fa266efeaff0ea8024
https://doi.org/10.1117/12.846716
https://doi.org/10.1117/12.846716
