Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Phil Strenski"'
Autor:
Young O. Kim, Emily Gallagher, Yuri Granik, Kafai Lai, Daniele Paolo Scarpazza, Nick Cobb, Tom Faure, Lei Zhuang, Saeed Bagheri, Alan E. Rosenbluth, Greg McIntyre, Laszlo Ladanyi, Andreas Waechter, Geoffrey W. Burr, Moutaz Fakhry, Michael Lam, Francisco Barahona, Jason E. Meiring, Kehan Tian, David O. S. Melville, Aasutosh Dave, Phil Strenski, Jon Lee, Jaione Tirapu-Azpiroz, Alexander Tritchkov, Hidemasa Muta, Masaharu Sakamoto, Tadanobu Inoue, Azalia A. Krasnoperova, Gabriel Berger, Alfred Wagner, Kostas Adam, Mike Hibbs, Daniel Corliss, Scott Halle
Publikováno v:
SPIE Proceedings.
In recent years the potential of Source-Mask Optimization (SMO) as an enabling technology for 22nm-and-beyond lithography has been explored and documented in the literature.1-5 It has been shown that intensive optimization of the fundamental degrees
Autor:
Burns, Jeffrey L., Feldman, Jack A.
Publikováno v:
Proceedings of the 1997 International Symposium: Physical Design; Apr1997, p110-115, 6p
Autor:
Topaloglu, Rasit O.
Publikováno v:
Proceedings of the International Conference Computer-aided Design; 11/18/2013, p569-571, 3p
Autor:
Gianni Pillo, Almerico Murli
This volume contains the edited texts of the lectures presented at the Workshop on High Performance Algorithms and Software for Nonlinear Optimization held in Erice, Sicily, at the'G. Stampacchia'School of Mathematics of the'E. Majorana'Centre for Sc
Autor:
Allen Goldman
The study of the effects of dimensional ity and disorder on phase transitions, electronic transport, and superconductivity has become an important field of research in condensed matter physics. These effects are both classical and quantum mechanical
Autor:
David Chinnery, Kurt Keutzer
by Kurt Keutzer Those looking for a quick overview of the book should fast-forward to the Introduction in Chapter 1. What follows is a personal account of the creation of this book. The challenge from Earl Killian, formerly an architect of the MIPS p
Handbook of Ion Beam Processing Technology : Principles, Deposition, Film Modification and Synthesis
Deals with ion beam processing for basic sputter etching of samples, sputter deposition of thin films, the synthesis of material in thin film form, and the modification of the properties of thin films.