Zobrazeno 1 - 10
of 13
pro vyhledávání: '"Petrie Yam"'
Publikováno v:
Photomask Technology 2022.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4d7cab1c1fc09b9f102a12a297182625
https://doi.org/10.1117/12.2641556
https://doi.org/10.1117/12.2641556
Publikováno v:
Solid State Phenomena. 255:207-212
A novel transducer for megasonic cleaning of photomasks presents an approach that differs from previous configurations, and appears to have unique features for cleaning while minimizing damage. As the cleaning and damage processes are determined by t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bf2a7147bf519680cc58a4d69b52907b
https://doi.org/10.4028/www.scientific.net/ssp.255.207
https://doi.org/10.4028/www.scientific.net/ssp.255.207
Publikováno v:
MRS Advances. 1:2247-2253
Sonication is a commonly used method for particle removal from various surfaces. There has been a growing interest in the use of combination of two or more acoustic frequencies for cleaning as it is expected to achieve better particle removal efficie
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8fa3992f15271b0959837c778e3d1c93
https://doi.org/10.1557/adv.2016.312
https://doi.org/10.1557/adv.2016.312
Autor:
Xi Chen, Mona Nagel, Anfal Alobeidli, Petrie Yam, Sharyl Maraviov, Claudio I. Zanelli, Farhang Shadman, Manish Keswani, Mingrui Zhao
Publikováno v:
MRS Advances. 1:2255-2260
Surfactants are commonly used as additives in cleaning formulations during acoustic cleaning of semiconductor surfaces. Since surfactants are surface active, they can affect cavitation characteristics and, therefore, influence cleaning efficiency and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::059ef6cef7bf5ee9bbf2924022b3dc33
https://doi.org/10.1557/adv.2016.313
https://doi.org/10.1557/adv.2016.313
Publikováno v:
Microelectronic Engineering. 133:45-50
Display Omitted Identified conditions in the range of 1-3MHz to achieve damage-free cleaning.Characterized cavitation using microelectrode and hydrophone measurements.OH concentration measured using fluorescence spectroscopy.Transient cavitation domi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::18ffe9530c25bc07b17e815bdff4216e
https://doi.org/10.1016/j.mee.2014.11.020
https://doi.org/10.1016/j.mee.2014.11.020
Autor:
Zhenxing Han, Petrie Yam, Claudio I. Zanelli, Nicolas Candia, Johann Brunner, Joachim Straka, Sam Howard
Publikováno v:
Photomask Technology.
Megasonic agitation continues to be used in advanced 193i and EUV photomask cleaning processes. The trend to adopt higher frequencies is driven by the need to control a tighter process window with shrinking feature sizes and a zerotolerance defect re
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4364620ab0f53f678132daf7f306b18c
https://doi.org/10.1117/12.2281272
https://doi.org/10.1117/12.2281272
Autor:
P.R. Madigappu, Manish Keswani, R. Sierra, Claudio I. Zanelli, Petrie Yam, Rajesh Balachandran, Mingrui Zhao
Publikováno v:
Solid State Phenomena. 219:165-169
Emerging ultrasonic and megasonic cleaning demands in various applications (solar cell, storage devices, wafer and mask cleaning, etc.) dictate the need to understand the acoustic cavitation under different operating conditions to optimize efficiency
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9127770a388b1d5fd46219dd82777451
https://doi.org/10.4028/www.scientific.net/ssp.219.165
https://doi.org/10.4028/www.scientific.net/ssp.219.165
Publikováno v:
SPIE Proceedings.
Wet photomask cleaning relies on megasonic agitation to enhance the process, but there are many challenges to reliably maximize particle removal efficiency (PRE) and minimize damage. With the shift to pellicle-free EUV masks, photomask processes are
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2ab7fd074845c8d759fc61bd730425ec
https://doi.org/10.1117/12.2243124
https://doi.org/10.1117/12.2243124