Zobrazeno 1 - 10
of 16
pro vyhledávání: '"Petrie Yam"'
Publikováno v:
Photomask Technology 2022.
Publikováno v:
Solid State Phenomena. 255:207-212
A novel transducer for megasonic cleaning of photomasks presents an approach that differs from previous configurations, and appears to have unique features for cleaning while minimizing damage. As the cleaning and damage processes are determined by t
Publikováno v:
MRS Advances. 1:2247-2253
Sonication is a commonly used method for particle removal from various surfaces. There has been a growing interest in the use of combination of two or more acoustic frequencies for cleaning as it is expected to achieve better particle removal efficie
Autor:
Xi Chen, Mona Nagel, Anfal Alobeidli, Petrie Yam, Sharyl Maraviov, Claudio I. Zanelli, Farhang Shadman, Manish Keswani, Mingrui Zhao
Publikováno v:
MRS Advances. 1:2255-2260
Surfactants are commonly used as additives in cleaning formulations during acoustic cleaning of semiconductor surfaces. Since surfactants are surface active, they can affect cavitation characteristics and, therefore, influence cleaning efficiency and
Publikováno v:
Microelectronic Engineering. 133:45-50
Display Omitted Identified conditions in the range of 1-3MHz to achieve damage-free cleaning.Characterized cavitation using microelectrode and hydrophone measurements.OH concentration measured using fluorescence spectroscopy.Transient cavitation domi
Autor:
Zhenxing Han, Petrie Yam, Claudio I. Zanelli, Nicolas Candia, Johann Brunner, Joachim Straka, Sam Howard
Publikováno v:
Photomask Technology.
Megasonic agitation continues to be used in advanced 193i and EUV photomask cleaning processes. The trend to adopt higher frequencies is driven by the need to control a tighter process window with shrinking feature sizes and a zerotolerance defect re
Autor:
P.R. Madigappu, Manish Keswani, R. Sierra, Claudio I. Zanelli, Petrie Yam, Rajesh Balachandran, Mingrui Zhao
Publikováno v:
Solid State Phenomena. 219:165-169
Emerging ultrasonic and megasonic cleaning demands in various applications (solar cell, storage devices, wafer and mask cleaning, etc.) dictate the need to understand the acoustic cavitation under different operating conditions to optimize efficiency
Publikováno v:
SPIE Proceedings.
Wet photomask cleaning relies on megasonic agitation to enhance the process, but there are many challenges to reliably maximize particle removal efficiency (PRE) and minimize damage. With the shift to pellicle-free EUV masks, photomask processes are