Zobrazeno 1 - 10
of 15
pro vyhledávání: '"Petr Kostelník"'
Autor:
A. Constant, Freddy De Pestel, H. Ziad, Joris Baele, Tomas Novak, Peter Coppens, Petr Kostelník
Publikováno v:
Materials Science in Semiconductor Processing. 137:106157
Polycrystalline AlN grown on Si3N4 by metal organic chemical vapor deposition is found to be wet etched by EKC265™ polymer strip solution, in which the active component is hydroxylamine (H3NO). The etch rate shows to be strongly dependent on surfac
Publikováno v:
Applied Surface Science. 421:859-865
We report an investigation of the optical and structural properties of wurtzite phase AlxGa1-xN/AlN structure grown on Si(111) within the compositional range of 0
Publikováno v:
physica status solidi (b). 256:1970040
Publikováno v:
Japanese Journal of Applied Physics. 58:SCCD26
Publikováno v:
Japanese Journal of Applied Physics. 58:SC1018
Publikováno v:
Solid State Phenomena. :284-289
We report on a novel method of low pressure chemical vapor deposition of polycrystalline silicon layers used for external gettering in silicon substrate for semiconductor applications. The proposed method allowed us to produce layers of polycrystalli
Autor:
Petr Kostelník, Jan Sik
Publikováno v:
Advanced Science, Engineering and Medicine. 5:603-607
Autor:
Jindřich Mach, Petr Kostelník, J. Spousta, Petr Bábor, Stanislav Voborný, Tomáš Šikola, Jan Čechal
Publikováno v:
Surface Science. 601:2047-2053
Results for deposition and thermal annealing of gallium on the Si(1 0 0)-(2 × 1) surface achieved by synchrotron radiation photoelectron spectroscopy (SR-PES) and low energy electron diffraction (LEED) are presented. In addition to deposition of Ga
Autor:
Edvin Lundgren, Nicola Seriani, Peter Varga, Volker Blum, Tomáš Šikola, Michael Schmid, Anders Mikkelsen, Georg Kresse, Petr Kostelník
Publikováno v:
Surface Science. 601:1574-1581
Using low energy electron diffraction (LEED), density functional theory (DFT) and scanning tunneling microscopy (STM), we have re-analyzed the Pd(100)-(root 5 x root 5)R27 degrees-O surface oxide structure consisting, in the most recent model, of a s
Autor:
Petr Bábor, M. Plojhar, Petr Kostelník, Miroslav Kolíbal, O. Tomanec, Peter Bauer, Tomáš Šikola, Michal Potoček, Stanislav Průša, S.N. Markin
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 249:318-321
In the paper the ability of TOF-LEIS to monitor the growth of ultrathin Ga layers in situ is presented. The FWHM of the Ga peaks in the TOF-LEIS spectra showed a linear dependence on Ga coverage. The analysis of the Ga growth on two Si(1 1 1) substra