Zobrazeno 1 - 10
of 25
pro vyhledávání: '"Peter Zink"'
Autor:
Andrea Weatherly, Gaurav Nanda, Huachao Mao, Joseph Zaccaria, Grant Richards, Peter Zink, Brittany Newell, James A. Bennett, Ragu Athinarayanan, Jun Yamasaki, Balamurugan Balakreshnan
Publikováno v:
SSRN Electronic Journal.
Industrial Internet of Things (IIoT) is a core technology of Industry 4.0 capable of providing transformative data and insights. Successful implementation of IIoT requires knowledge bridging the Information Technology (IT) and Operational Technology
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f09d59ea49a13d87e6a1c59c87dfdf3b
https://doi.org/10.2139/ssrn.3859672
https://doi.org/10.2139/ssrn.3859672
Autor:
Peter Zink Secher, Ian Horley
The formula that transforms the probability of success when growing your business with M&A The M&A Formula brings together decades of research and case studies from recognised leaders into a model that anybody can use to grow their business using M&A
Autor:
Guido Schriever, Peter Zink
Publikováno v:
Optik & Photonik. 3:40-43
Semiconductor device manufacturing is currently using excimer lasers as the light source for lithographic structuring. The wavelength of these ArF lasers is 193 nm and the high volume manufacturing of structures with 45 nm has started already. To fur
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7213e6bcda157f9dbba0324324a950b6
https://doi.org/10.1002/opph.201190189
https://doi.org/10.1002/opph.201190189
Autor:
Jeroen Jonkers, Rolf Wester, Günther Derra, Klaus Bergmann, Joseph Pankert, Thomas Krücken, Willi Neff, Dominik Marcel Vaudrevange, Stefan Seiwert, Oliver Rosier, Rolf Apetz, Peter Zink, Guido Siemons, Jürgen Klein, Sven Probst, Christopher Smith, Michael Loeken
The light source has been identified as being the most critical single component on the way to realizing EUVL. The requirements on the source are derived from a throughput model for the processing of up to 120 wafers per hour in a commercial EUV scan
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5a4a7fa5817fed0ace52288703cda14d
https://doi.org/10.1117/3.613774.ch13
https://doi.org/10.1117/3.613774.ch13
Publikováno v:
SPIE Proceedings.
For industrial EUV (extreme ultra-violet) lithography applications high power EUV light sources are needed at a central wavelength of 13.5 nm. Philips Extreme UV GmbH, EUVA and XTREME technologies GmbH have jointly developed tin DPP (Discharge Produc
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2f3bca42091f99cba9eabb23bed6b5b3
https://doi.org/10.1117/12.846545
https://doi.org/10.1117/12.846545
Autor:
Jeroen Jonkers, Guido Schriever, Sven Götze, Masaki Yoshioka, Günther Derra, Rob Snijkers, Rainer Müller, Max C. Schürmann, Jürgen Dr. Kleinschmidt, Denis Bolshukhin, Peter Zink, Marc Corthout
Publikováno v:
Alternative Lithographic Technologies.
The learning gained in previous developments for EUV Micro Exposure and Alpha Tools builds the basis for the EUVL source development at XTREME technologies and Philips EUV. Field data available from operation of these tools are in use for continuous
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f96943a5ce3ac5fae1d1b109e95abf5a
https://doi.org/10.1117/12.814100
https://doi.org/10.1117/12.814100
Autor:
M. Prea, Giovanni Bianucci, Max C. Schürmann, Fabio Zocchi, G. Salmaso, Giuseppe Valsecchi, Arnaud Mader, Gian Luca Cassol, J. Kools, Denis Bolshukhin, Peter Zink, Guido Schriever
Publikováno v:
Alternative Lithographic Technologies.
The power roadmap for EUVL high volume manufacturing (HVM) exceeds the 200W EUV in-band power at intermediate focus, thus posing more demanding requirements on HVM sources, debris suppression systems and collectors. Starting from the lessons learned
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c0007f316e0cd330eef8f9968c067ad0
https://doi.org/10.1117/12.813652
https://doi.org/10.1117/12.813652
Publikováno v:
SPIE Proceedings.
XTREME technologies and Philips EUV have provided the majority of available EUV sources based on Discharge Produced Plasma (DPP) technology worldwide since 2003. The fact that all existing prototype scanners make use of DPP sources and that further p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2b54ba5a0a353bb7305f169f20e9bbb1
https://doi.org/10.1117/12.804687
https://doi.org/10.1117/12.804687