Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Peter Wilkens"'
Autor:
Gabriele Fobbe, Martina Heßbrügge, Hermann C. Römer, Wolfgang Beyer, Anne Breetholt, Dorothea Dehnen, Stefan Esser, Andreas Fidrich, Christoph Gerhard, Michael Masrour, Stefanie Merse, Sandra Niggemeier, Denise Rosenberger, Christian Schleuss, Edgar Strauch, Eva Strüwer, Christine Wienstroth, Thomas Dirschka, Stefan Gesenhues, Martin Hermann, Harald Messner, Thomas Quellmann, Heinz-Christian Wilkens, Klaus-Peter Wilkens
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0cb9be655be597df033f1383a71573e6
https://doi.org/10.1016/b978-3-437-22422-5.01002-2
https://doi.org/10.1016/b978-3-437-22422-5.01002-2
Autor:
Jie Li, Holger Schroder, Sanjay Yedur, Peter Wilkens, Karthik Boinapally, Shahin Zangooie, John Piggot, Babak Khamsepour, Avraham Ver, Zhuan Liu, Jiangtao Hu
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXVIII.
Reducing parameter correlations to enhance scatterometry measurement accuracy, precision and tool matching is a crucial component of every modeling effort. Parameter sensitivity can largely depend on the orientation of the plane of incidence relative
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9667b371c3e658e03a2406839488b8ba
https://doi.org/10.1117/12.2046165
https://doi.org/10.1117/12.2046165
Autor:
Xi Zou, Zhuan Liu, Jiangtao Hu, Jie Li, Peter Wilkens, Karthik Boinapally, Shahin Zangooie, Avraham Ver, Sanjay Yedur, Babak Khamsepour, Robert A. Cohen
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXVIII.
Optical critical dimension (OCD) metrology using scatterometry has been widely adopted for fast and non-destructive in-line process control and yield improvement. Recently there has been increased interest in metrology performance enhancement through
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::998b02afef05813f42f720ea0cbb4900
https://doi.org/10.1117/12.2046639
https://doi.org/10.1117/12.2046639
Autor:
Peter Wilkens, Thankasala P. Sarathy, Milad Tabet, Nicholas J. Keller, Satyanarayana Myneni, Shahin Zangooie
Publikováno v:
SPIE Proceedings.
A non-destructive and fast optical solution for characterization of high aspect ratio and isolated 3D hard disk drive writer head air bearing surface structure is presented in this paper. While 2D gratings are plagued by line bending and accuracy pro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::13d2b32b45962ac3cbff9683a03422d6
https://doi.org/10.1117/12.2011616
https://doi.org/10.1117/12.2011616
Autor:
Martin Hermann, Thomas Quellmann, Thomas Dirschka, Stefan Esser, Gabriele Fobbe, Stefan Gesenhues, Harald Messner, Christian Schleuss, Christine Wienstroth, Klaus-Peter Wilkens, Heinz-Christian Wilkens, Edgar Bührle, Sonja Chevallier, Wolfram Hartmann, Stefan Hauss, Astrid Munkenbeck-Dicke, M.R. Neuhaus, Ismail Sariaslan
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e3f835137fa25136e4c048e33d7fcf4c
https://doi.org/10.1016/b978-3-437-22421-8.10024-6
https://doi.org/10.1016/b978-3-437-22421-8.10024-6
Publikováno v:
SPIE Proceedings.
The CD measurements from CDSEMs is a two-step process, the first being the pixel based electron emission signal intensity profile generation and the second the algorithm treatment on the generated intensity profile for the dimension determination. Se
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3663f9d99610db2f90060cf136791456
https://doi.org/10.1117/12.600122
https://doi.org/10.1117/12.600122
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XVIII.
The appropriate definition and identification of total measurement uncertainty from a group of metrology tools is becoming ever important as process tolerances continue to shrink in today's data storage and semiconductor manufacturing environments. T
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fe45709b48efdc8ed232aa2a99838634
https://doi.org/10.1117/12.535526
https://doi.org/10.1117/12.535526
Autor:
Jie Li, Sanjay Yedur, Avraham Ver, Zhuan Liu, Peter Wilkens, Robert Cohen, Holger Schroder, Babak Khamsehpour, Jiangtao Hu, John Piggot, Karthik Boinapally, Shahin Zangooie, Xi Zou
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 13:041406
Scatterometry performance enhancement is demonstrated through a holistic approach by utilizing comprehensive information from various sources, including data from different process steps, different toolsets, multiple structures, and multiple optical
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::52911669e0ecd0599da9478493be47fd
https://doi.org/10.1117/1.jmm.13.4.041406
https://doi.org/10.1117/1.jmm.13.4.041406
Conference
Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.
K zobrazení výsledku je třeba se přihlásit.