Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Peter Tichy"'
Publikováno v:
Operative Orthopädie und Traumatologie. 3:130-141
Anatomisch adaptierte Stiele von Huftendoprothesen passen zentrisch in die Markhohle des Femur und berucksichtigen seine S-formige—proximal dorsalkonvexe, weiter distal ventralkonvexe—Krummung [5]. Drehfehler werden vermieden. Bei der Stufenosteo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8739ebf46d88da87cb90d73694409e47
https://doi.org/10.1007/bf02513613
https://doi.org/10.1007/bf02513613
Autor:
Takahiro Fukai, Rusty Cantrell, Axel Feicke, Shigenori Kamei, Gaston Lee, Martin Tschinkl, Wolfram Porsche, Tatsuhito Kotoda, Harry Asai, Peter Tichy
Publikováno v:
SPIE Proceedings.
A new photomask develop tool designed by Tokyo Electron Limited (TEL) with wafer puddle technology was evaluated at the Advanced Mask Technology Center (AMTC) in Dresden, Germany. Parameters selected for this evaluation were resist dark loss uniformi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ac5a9e939955cf146fddf4b2c4c3b551
https://doi.org/10.1117/12.568393
https://doi.org/10.1117/12.568393
Autor:
Gaston Lee, Wolfram Porsche, Tetsushi Miyamoto, Hideo Funakoshi, Shinji Koga, Yoshiki Okamoto, Shigenori Kamei, Shigemi Oono, Takahiro Fukai, Rusty Cantrell, Hiroshi Asai, Martin Tschinkl, Tatsuhito Kotoda, Axel Feicke, Peter Tichy, Kazuhiro Takeshita
Publikováno v:
SPIE Proceedings.
The challenges, mask manufacturing is faced with, are more and more dominating the semiconductor industry as the pattern sizes shrink. Today's mask patterns have reached sizes that are common in wafer manufacturing. Looking into the industry, we can
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5aea07948e24d03fa205a2e63281f5b9
https://doi.org/10.1117/12.568820
https://doi.org/10.1117/12.568820